Sugi Predict

Sugi Predict / Compounds / SCHEMBL3789604

SCHEMBL3789604

SCHEMBL3789604

CCCCOC(=O)CC[C@@H](C)[C@H]1CC[C@H]2[C@@H]3CC[C@@H]4C[C@H](O)CC[C@]4(C)[C@H]3CC[C@]12C

nearest known ligand 0.76

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GPBAR1 Q8TDU6 4/20 0.76
▸ VDR P11473 4/20 0.76
▸ HIF1A Q16665 3/20 0.76
▸ CYP2C9 P11712 2/20 0.76
▸ EPHA2 P29317 4/20 0.71
▸ CASP7 P55210 3/20 0.71
▸ TP53 P04637 2/20 0.71
▸ MAPK1 P28482 2/20 0.71
▸ HSD17B10 Q99714 2/20 0.71
▸ BLM P54132 2/20 0.71
▸ TDP1 Q9NUW8 2/20 0.71
▸ USP2 O75604 2/20 0.71
▸ CYP3A4 P08684 2/20 0.71
▸ MDM4 O15151 1/20 0.71
▸ MAPT P10636 1/20 0.71
▸ HSPD1 P10809 1/20 0.71
▸ TSHR P16473 1/20 0.71
▸ PTPN2 P17706 1/20 0.71
▸ PTPN1 P18031 1/20 0.71
▸ BRCA1 P38398 1/20 0.71

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26424132 1.00 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL25470138 1.00 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL29292553 1.00 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL3789605 1.00 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL5969937 0.96 GPBAR1 (0.71) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL5431009 0.96 GPBAR1 (0.71) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL18920920 0.96 GPBAR1 (0.73) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL18920921 0.96 GPBAR1 (0.73) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL34469392 0.96 GPBAR1 (0.73) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL34469864 0.96 GPBAR1 (0.73) GPBAR1VDRHIF1ACYP2C9EPHA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240226287-A1 NOVEL LIPID COMPOUND AND LIPID NANOPARTICLE COMPOSITION COMPRISING THE SAME KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2024-07-11 — — US claimed
WO-2024128525-A1 NOVEL LIPID COMPOUND AND LIPID NANOPARTICLE COMPOSITION COMPRISING SAME 한국과학기술연구원 2024-06-20 — — WO claimed
US-20040106062-A1 Photoacid generators in photoresist compositions for microlithography E. I. DU PONT DE NEMOURS AND COMPANY 2004-06-03 — — US claimed
EP-1332406-A2 PHOTOACID GENERATORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E. I. du Pont de Nemours and Company (US) 2003-08-06 — — EP claimed
WO-2002039186-A2 PHOTOACID GENERATORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E. I. DU PONT DE NEMOURS AND COMPANY (US) 2002-05-16 — — WO claimed
US-20240226287-A1 NOVEL LIPID COMPOUND AND LIPID NANOPARTICLE COMPOSITION COMPRISING THE SAME KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2024-07-11 — — US disclosed
US-20240226287-A1 NOVEL LIPID COMPOUND AND LIPID NANOPARTICLE COMPOSITION COMPRISING THE SAME KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2024-07-11 — — US disclosed
US-20240226287-A1 NOVEL LIPID COMPOUND AND LIPID NANOPARTICLE COMPOSITION COMPRISING THE SAME KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2024-07-11 — — US disclosed
WO-2024128525-A1 NOVEL LIPID COMPOUND AND LIPID NANOPARTICLE COMPOSITION COMPRISING SAME 한국과학기술연구원 2024-06-20 — — WO disclosed
CN-109782553-A Photoresist developer 台湾积体电路制造股份有限公司 2019-05-21 — — CN disclosed
CN-109782540-A The forming method of photoetching agent pattern 台湾积体电路制造股份有限公司 2019-05-21 — — CN disclosed
CN-104391429-B Radiation sensitive resin composition, polymer and resist pattern forming method JSR株式会社 2018-12-18 — — CN disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 — — US disclosed
US-7005230-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-02-28 — — US disclosed
US-6800419-B2 FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY JSR CORPORATION (JP) 2004-10-05 — — US disclosed
US-20040146802-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-07-29 — — US disclosed
US-20030203307-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-30 — — US disclosed
US-5266566-A Method of treating fungal infections using sterodial ester compounds BRITISH TECHNOLOGY GROUP LIMITED 1993-11-30 — — US disclosed
EP-0470995-A1 USE OF STEROIDAL COMPOUNDS AS ANTI-FUNGAL AGENTS. NAT RES DEV (GB) 1992-02-19 — — EP disclosed
WO-1990013298-A1 USE OF STEROIDAL COMPOUNDS AS ANTI-FUNGAL AGENTS NATIONAL RESEARCH DEVELOPMENT CORPORATION (GB) 1990-11-15 — — WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240226287-A1 NOVEL LIPID COMPOUND AND LIPID NANOPARTICLE COMPOSITION COMPRISING THE SAME HDLBP, LRAT, CETP GPBAR1 1184/4885VDR 7/4885HIF1A 797/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.