SCHEMBL3793160

SCHEMBL3793160

CC(C)[Hg]C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11425902 0.59
SCHEMBL31079448 0.58
Isobutane SCHEMBL11313074 0.53 TSHR (0.50)
Isobutane SCHEMBL20490082 0.53 TSHR (0.50)
Isobutane SCHEMBL1022735 0.53
SCHEMBL29372284 0.53
Isobutane SCHEMBL30536981 0.53
Isobutane SCHEMBL7754023 0.53 TSHR (0.50)
Isobutane SCHEMBL768 0.53
Isobutane SCHEMBL2162423 0.53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0950670-B1 Olefin polymerization process and catalyst system therefor BAYER INC (CA) 2002-03-27 EP claimed
EP-0950670-A2 Olefin polymerization process and catalyst system therefor Bayer Inc. (CA) 1999-10-20 EP claimed
US-3967964-A Photosensitive film comprising an organopolyselenide and an organomercury compound XEROX CORPORATION (US) 1976-07-06 US claimed
US-20100059360-A1 Method For The Production Of Nanoparticles WENDLING THOMAS 2010-03-11 US disclosed
EP-0950670-B1 Olefin polymerization process and catalyst system therefor BAYER INC (CA) 2002-03-27 EP disclosed
EP-0950670-A2 Olefin polymerization process and catalyst system therefor Bayer Inc. (CA) 1999-10-20 EP disclosed
US-4734514-A SEMICONDUCTORS, OPTICAL AND OPTOELECTRONIC INDUSTRIES; DOPANTS MORTON THIOKOL, INC. (US) 1988-03-29 US disclosed
EP-0181706-A1 Hybrid organometallic compounds of In and ba and process for metal organic chemical vapour deposition MORTON THIOKOL, INC. (US) 1986-05-21 EP disclosed
US-4228213-A CONTACTING A SURFACE WITH A SOURCE OF CUPRIC IONS, REDUCING AGENT, COMPLEXING AGENT WESTERN ELECTRIC COMPANY, INC. (US) 1980-10-14 US disclosed
US-4214926-A VAPOR PHASE CRYSTALLIZATION USING ZINC, CADMIUM, OR MERCURY HYDROCARBONS OR HYDRIDES OF SULFUR, SELENIUM, OR TELLURIUM TDK ELECTRONICS CO., LTD. (JP) 1980-07-29 US disclosed
US-4167601-A Method of depositing a stress-free electroless copper deposit WESTERN ELECTRIC COMPANY, INC. (US) 1979-09-11 US disclosed
US-3967964-A Photosensitive film comprising an organopolyselenide and an organomercury compound XEROX CORPORATION (US) 1976-07-06 US disclosed