SCHEMBL379625

SCHEMBL379625

OCOC1CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL379568 0.97
SCHEMBL4497143 0.91
SCHEMBL3903213 0.84
SCHEMBL1020946 0.84
SCHEMBL2914483 0.80 SERPINE1 (0.31)
SCHEMBL9039744 0.78 NPC1 (0.52)
SCHEMBL10942317 0.78 NPC1 (0.52)
SCHEMBL899067 0.78 NPC1 (0.52)
SCHEMBL28372628 0.78 NPC1 (0.52)
SCHEMBL10357183 0.75 NPC1 (0.61)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 178 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090042957-A1 Substituted Oxyarenes BAYER CROPSCIENCE AG (DE) 2009-02-12 US claimed
EP-1831145-A1 SUBSTITUTED OXYARENES Bayer CropScience Aktiengesellschaft (DE) 2007-09-12 EP claimed
WO-2006069685-A1 SUBSTITUTED OXYARENES BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2006-07-06 WO claimed
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-26 US disclosed
EP-4219477-A1 CYANOTRIAZOLE COMPOUNDS Otsuka Pharmaceutical Co., Ltd. (JP) 2023-08-02 EP disclosed
WO-2022159777-A1 POLY(CYCLIC ACETAL)S, METHODS OF MAKING SAME, AND USES THEREOF CORNELL UNIVERSITY (US) 2022-07-28 WO disclosed
CN-113490721-A Modified copolyester resin and aqueous dispersion thereof 东洋纺株式会社 2021-10-08 CN disclosed
CN-107924123-B Material for lithography, method for producing same, composition for lithography, method for forming pattern, compound, resin, and method for purifying same 学校法人关西大学 2021-08-06 CN disclosed
EP-3858844-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES Universal Display Corporation (US) 2021-08-04 EP disclosed
WO-2021113958-A1 CANNABINOID DERIVATIVES CANOPY GROWTH CORPORATION (CA) 2021-06-17 WO disclosed
EP-3305796-B1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES UNIVERSAL DISPLAY CORP (US) 2021-03-31 EP disclosed
US-5559111-A HYPOTENSIVE AGENTS; RENIN INHIBITORS; Aliskiren CIBA-GEIGY CORPORATION (US) 1996-09-24 US disclosed
EP-0678503-A1 Delta-amino-gamma-hydroxy-omega-aryl alkanoic acid amides with enzyme especially renin inhibiting activities CIBA-GEIGY AG (CH) 1995-10-25 EP disclosed
US-4767883-A PHOTORESISTS; FLEXIBILITY; LOW VISCOSITY, HIGH GLASS TRANSITION TEMPERATURE; CROSSLINKABLE EASTMAN KODAK COMPANY (US) 1988-08-30 US disclosed
EP-0110826-B1 6-HYDROXY LOWER ALKYL PENEM COMPOUNDS, PROCESS FOR THEIR PREPARATION, PHARMACEUTICAL COMPOSITIONS CONTAINING THEM AND THEIR USE CIBA-GEIGY AG (CH) 1987-08-19 EP disclosed
EP-0112283-B1 HETEROCYCLYL-THIO COMPOUNDS, PROCESS FOR THEIR PREPARATION, PHARMACEUTICAL COMPOSITIONS CONTAINING THEM AND THEIR USE CIBA-GEIGY AG (CH) 1987-08-12 EP disclosed
EP-0112283-A1 Heterocyclyl-thio compounds, process for their preparation, pharmaceutical compositions containing them and their use CIBA-GEIGY AG (CH) 1984-06-27 EP disclosed
EP-0110826-A1 6-Hydroxy lower alkyl penem compounds, process for their preparation, pharmaceutical compositions containing them and their use CIBA-GEIGY AG (CH) 1984-06-13 EP disclosed
EP-0109362-A1 Hetereocyclic compounds, process for their preparation, pharmaceutical compositions containing them and their use CIBA-GEIGY AG (CH) 1984-05-23 EP disclosed
EP-0082113-A1 2-Aminobytyl-2-penem derivatives, process for their preparation and pharmaceutical compositions containing them CIBA-GEIGY AG (CH) 1983-06-22 EP disclosed