⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17711033 | 0.87 | — | — | |
| SCHEMBL15398526 | 0.87 | — | — | |
| SCHEMBL216685 | 0.87 | — | — | |
| SCHEMBL529978 | 0.87 | — | — | |
| SCHEMBL2897143 | 0.87 | — | — | |
| SCHEMBL10379776 | 0.82 | — | — | |
| SCHEMBL2945455 | 0.82 | — | — | |
| SCHEMBL7729 | 0.82 | — | — | |
| SCHEMBL8854401 | 0.82 | — | — | |
| SCHEMBL4956668 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 201 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120192159-A | Preparation method of zinc-aluminum-oxide AZO alloy target | 湖南玉丰真空科学技术有限公司 | 2025-06-24 | — | — | CN | claimed |
| CN-119252731-B | Silicon substrate gallium nitride wafer containing large mismatch stress regulation structure and preparation method and application thereof | 深圳市中科半导体科技有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-119800347-A | Cold spraying zinc-aluminum composite coating method for power transmission and transformation equipment and zinc-aluminum composite coating | 华北电力科学研究院有限责任公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119683867-A | Preparation method of toughened low-emissivity coated glass | 新福兴玻璃工业集团有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-119683874-A | Preparation method of toughened low-emissivity coated glass | 新福兴玻璃工业集团有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-119252731-A | Silicon substrate gallium nitride wafer containing large mismatch stress regulation structure and preparation method and application thereof | 深圳市中科半导体科技有限公司 | 2025-01-03 | — | — | CN | claimed |
| US-12172896-B2 | ATR-based hydrogen process and plant | HALDOR TOPSØE A/S (DK) | 2024-12-24 | — | — | US | claimed |
| US-20240059563-A1 | ATR-BASED HYDROGEN PROCESS AND PLANT | HALDOR TOPSØE A/S (DK) | 2024-02-22 | — | — | US | claimed |
| EP-4045457-A1 | ATR-BASED HYDROGEN PROCESS AND PLANT | Topsoe A/S (DK) | 2022-08-24 | — | — | EP | claimed |
| US-20220194789-A1 | ATR-BASED HYDROGEN PROCESS AND PLANT | HALDOR TOPSØE A/S (DK) | 2022-06-23 | — | — | US | claimed |
| US-20030150711-A1 | Coated article with high visible transmission and low emissivity | Guardian Europe S.à r.l. (LU) | 2003-08-14 | — | — | US | claimed |
| WO-2003033427-A1 | COATED ARTICLE WITH HIGH VISIBLE TRANSMISSION AND LOW EMISSIVITY | GUARDIAN INDUSTRIES CORP. (US) | 2003-04-24 | — | — | WO | claimed |
| EP-1115670-B1 | ALKALI METAL DIFFUSION BARRIER LAYER | PPG IND OHIO INC (US) | 2002-07-17 | — | — | EP | claimed |
| US-6352755-B1 | Alkali metal diffusion barrier layer | PPG INDUSTRIES OHIO, INC. | 2002-03-05 | — | — | US | claimed |
| EP-1115670-A1 | ALKALI METAL DIFFUSION BARRIER LAYER | PPG Industries Ohio, Inc. (US) | 2001-07-18 | — | — | EP | claimed |
| WO-2000015571-A1 | ALKALI METAL DIFFUSION BARRIER LAYER | PPG INDUSTRIES OHIO, INC. (US) | 2000-03-23 | — | — | WO | claimed |
| EP-0705801-B1 | Alkali metal diffusion barrier layer | PPG INDUSTRIES INC (US) | 1998-12-02 | — | — | EP | claimed |
| EP-0787696-A1 | Alkali metal diffusion barrier layer | PPG INDUSTRIES, INC. (US) | 1997-08-06 | — | — | EP | claimed |
| CN-1134920-A | Alkali metal diffusion barrier layer | PPG INDUSTRIES INC (US) | 1996-11-06 | — | — | CN | claimed |
| EP-0705801-A1 | Alkali metal diffusion barrier layer | PPG INDUSTRIES, INC. (US) | 1996-04-10 | — | — | EP | claimed |