⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27747854 | 0.76 | — | — | |
| SCHEMBL2388550 | 0.76 | — | — | |
| SCHEMBL27979607 | 0.70 | — | — | |
| SCHEMBL6722638 | 0.67 | — | — | |
| SCHEMBL2100376 | 0.64 | — | — | |
| SCHEMBL2102685 | 0.64 | — | — | |
| SCHEMBL27887959 | 0.64 | — | — | |
| SCHEMBL35296 | 0.61 | — | — | |
| SCHEMBL2415742 | 0.61 | — | — | |
| SCHEMBL51749 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10170354-B2 | Subtractive methods for creating dielectric isolation structures within open features | TOKYO ELECTRON LIMITED (JP) | 2019-01-01 | — | — | US | claimed |
| US-9633847-B2 | Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition | TOKYO ELECTRON LIMITED (JP) | 2017-04-25 | — | — | US | claimed |
| US-20160300756-A1 | SUBTRACTIVE METHODS FOR CREATING DIELECTRIC ISOLATION STRUCTURES WITHIN OPEN FEATURES | TOKYO ELECTRON LIMITED (JP) | 2016-10-13 | — | — | US | claimed |
| US-20160300711-A1 | USING SUB-RESOLUTION OPENINGS TO AID IN IMAGE REVERSAL, DIRECTED SELF-ASSEMBLY, AND SELECTIVE DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2016-10-13 | — | — | US | claimed |
| US-10170354-B2 | Subtractive methods for creating dielectric isolation structures within open features | TOKYO ELECTRON LIMITED (JP) | 2019-01-01 | — | — | US | disclosed |
| US-9633847-B2 | Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition | TOKYO ELECTRON LIMITED (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20160300756-A1 | SUBTRACTIVE METHODS FOR CREATING DIELECTRIC ISOLATION STRUCTURES WITHIN OPEN FEATURES | TOKYO ELECTRON LIMITED (JP) | 2016-10-13 | — | — | US | disclosed |
| US-20160300711-A1 | USING SUB-RESOLUTION OPENINGS TO AID IN IMAGE REVERSAL, DIRECTED SELF-ASSEMBLY, AND SELECTIVE DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2016-10-13 | — | — | US | disclosed |
| US-8877073-B2 | Imprint lithography template | CANON NANOTECHNOLOGIES, INC. (US) | 2014-11-04 | — | — | US | disclosed |
| WO-2010062319-A1 | IMPRINT LITHOGRAPHY TEMPLATE | MOLECULAR IMPRINTS, INC. (US) | 2010-06-03 | — | — | WO | disclosed |
| US-20100102029-A1 | Imprint Lithography Template | MOLECULAR IMPRINTS, INC. (US) | 2010-04-29 | — | — | US | disclosed |