SCHEMBL3816600

SCHEMBL3816600

CCCOP(=O)(OCC(C)C)OCC(C)C

nearest known ligand 0.50

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.50
L3MBTL1 Q9Y468 1/20 0.44
TSHR P16473 2/20 0.43
ALDH1A1 P00352 2/20 0.37
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
TRPM8 Q7Z2W7 1/20 0.34
HSD17B10 Q99714 1/20 0.33
LPAR5 Q9H1C0 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2231111 0.92 CYP3A4 (0.65) CYP3A4L3MBTL1TSHRTRPM8
SCHEMBL3821063 0.87 CYP3A4 (0.71) CYP3A4L3MBTL1TSHRTRPM8
SCHEMBL6868292 0.87 CYP3A4 (0.71) CYP3A4L3MBTL1TSHRTRPM8
SCHEMBL4630569 0.85 CYP3A4 (0.61) CYP3A4L3MBTL1TSHRTRPM8LPAR5
SCHEMBL133326 0.85 TSHR (0.45) CYP3A4L3MBTL1TSHRALDH1A1MEN1
SCHEMBL6895750 0.84 CYP3A4 (0.59) CYP3A4L3MBTL1TSHRTRPM8LPAR5
SCHEMBL22974629 0.83 HSD17B10 (0.50) CYP3A4L3MBTL1TSHRALDH1A1MEN1
SCHEMBL15264318 0.83 CYP3A4 (0.46) CYP3A4L3MBTL1TSHRALDH1A1MEN1
SCHEMBL104844 0.83 CYP3A4 (0.68) CYP3A4L3MBTL1TSHRALDH1A1MEN1
SCHEMBL29145651 0.82 CYP3A4 (0.50) CYP3A4L3MBTL1TSHRALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060014843-A1 Vapor pressure depressant and use thereof DAIHACHI CHEMICAL INDUSTRY CO., LTD. (JP) 2006-01-19 US claimed
EP-1561793-A1 VAPOR PRESSURE DEPRESSANT AND USE THEREOF Daihachi Chemical Industry Co., Ltd. (JP) 2005-08-10 EP claimed
EP-3297837-B1 LASER MARKABLE COMPOSITIONS, ARTICLES AND DOCUMENTS AGFA GEVAERT (BE) 2019-07-31 EP disclosed
EP-1276551-B1 COMPOSITE MEMBRANE AND METHOD FOR MAKING THE SAME DOW GLOBAL TECHNOLOGIES INC (US) 2009-08-19 EP disclosed
US-20060014843-A1 Vapor pressure depressant and use thereof DAIHACHI CHEMICAL INDUSTRY CO., LTD. (JP) 2006-01-19 US disclosed
EP-1561793-A1 VAPOR PRESSURE DEPRESSANT AND USE THEREOF Daihachi Chemical Industry Co., Ltd. (JP) 2005-08-10 EP disclosed
US-6723241-B2 COMPRISING A POLYAMIDE LAYER ON A POROUS SUPPORT WHERE THE POLYAMIDE LAYER IS COMPLEXED OR HYDROGEN BONDED TO A PHOSPHORUS-CONTAINING COMPOUND; IMPROVED FLUX AND/OR REJECTION RATE; FILTERS; NANOFILTRATION AND REVERSE OSMOSIS DOW GLOBAL TECHNOLOGIES INC. 2004-04-20 US disclosed
US-20030116498-A1 Composite membrane and method for making the same THE DOW CHEMICAL COMPANY 2003-06-26 US disclosed
US-6562266-B2 Composite membrane and method for making the same DOW GLOBAL TECHNOLOGIES INC. 2003-05-13 US disclosed
EP-1276551-A2 COMPOSITE MEMBRANE AND METHOD FOR MAKING THE SAME DOW GLOBAL TECHNOLOGIES INC. (US) 2003-01-22 EP disclosed
US-20020113008-A1 Composite membrane and method for making the same THE DOW CHEMICAL COMPANY 2002-08-22 US disclosed
US-20010050252-A1 Composite membrane and method for making the same DOW GLOBAL TECHNOLOGIES LLC 2001-12-13 US disclosed
WO-2001078882-A2 COMPOSITE MEMBRANE AND METHOD FOR MAKING THE SAME DOW GLOBAL TECHNOLOGIES INC. (US) 2001-10-25 WO disclosed