SCHEMBL3817154

SCHEMBL3817154

[S-2].[S-2].[Sr+2].[Sr+2]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ATP4AATP4B

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL63926 1.00
SCHEMBL11850436 1.00
SCHEMBL4369048 0.82
SCHEMBL8403369 0.82
SCHEMBL10616542 0.82
SCHEMBL5961171 0.82
SCHEMBL4659072 0.82
Zinc Ion SCHEMBL11401011 0.82
SCHEMBL6675965 0.82
SCHEMBL3443292 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11588174-B2 Solid electrolyte and preparation method thereof, and electrochemical device and electronic device comprising solid electrolyte NINGDE AMPEREX TECHNOLOGY LIMITED (CN) 2023-02-21 US disclosed
US-20200235421-A1 SOLID ELECTROLYTE AND PREPARATION METHOD THEREOF, AND ELECTROCHEMICAL DEVICE AND ELECTRONIC DEVICE COMPRISING SOLID ELECTROLYTE NINGDE AMPEREX TECHNOLOGY LIMITED 2020-07-23 US disclosed
US-7556721-B2 Thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films IFIRE IP CORPORATION (CA) 2009-07-07 US disclosed
WO-2006045195-A1 NOVEL THIOSILICATE PHOSPHOR COMPOSITIONS AND DEPOSITION METHODS USING BARIUM-SILICON VACUUM DEPOSITION SOURCES FOR DEPOSITION OF THIOSILICATE PHOSPHOR FILMS IFIRE TECHNOLOGY CORP. (CA) 2006-05-04 WO disclosed
US-20060091000-A1 Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films IFIRE IP CORPORATION (CA) 2006-05-04 US disclosed