Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4579302 | 0.69 | — | — | |
| Bicarbonate SCHEMBL28225162 | 0.55 | — | — | |
| Nitrous Acid SCHEMBL78137 | 0.55 | — | — | |
| Nitrous Acid SCHEMBL9150857 | 0.55 | — | — | |
| Nitrous Acid SCHEMBL715658 | 0.51 | — | — | |
| Nitrous Acid SCHEMBL9063359 | 0.51 | — | — | |
| Nitrous Acid SCHEMBL3144387 | 0.51 | — | — | |
| Nitrous Acid SCHEMBL11342810 | 0.51 | — | — | |
| Nitrous Acid SCHEMBL715655 | 0.51 | — | — | |
| Nitrous Acid SCHEMBL9063370 | 0.51 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6423458-B1 | — | — | None | — | — | US | disclosed |
| EP-2482133-B1 | METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2017-01-18 | — | — | EP | disclosed |
| EP-1434101-B1 | Automatic processing method of photosensitive lithographic printing plate | FUJIFILM CORP (JP) | 2016-03-23 | — | — | EP | disclosed |
| EP-2482133-A1 | METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | FUJIFILM Corporation (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20120175239-A1 | METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| EP-1314552-B1 | Photosensitive resin composition | FUJIFILM CORP (JP) | 2009-08-05 | — | — | EP | disclosed |
| EP-1834767-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2009-02-25 | — | — | EP | disclosed |
| EP-1627734-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2008-10-15 | — | — | EP | disclosed |
| EP-1695821-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2007-12-12 | — | — | EP | disclosed |
| EP-1834767-A2 | Planographic printing plate precursor | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-6423467-B1 | USEFUL IN A LITHOGRAPHIC PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-23 | — | — | US | disclosed |
| US-6423458-B2 | ADDING TRACING SUBSTANCE TO LIGHT SENSITIVE LAYERS; MEASUREMENT; AUTOMATIC PROCESSOR | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-23 | — | — | US | disclosed |
| US-20020086233-A1 | Useful in a lithographic printing plates | FUJIFILM CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| EP-1011030-B1 | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2002-04-17 | — | — | EP | disclosed |
| US-20010037742-A1 | Monitoring method of developing solution for lithographic printing plates | FUJIFILM CORPORATION (JP) | 2001-11-08 | — | — | US | disclosed |
| US-6277541-B1 | MULTILAYER; ALUMINUM, ALUMINA AND ALKALI-SOLUBLE POLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 2001-08-21 | — | — | US | disclosed |
| EP-1011030-A1 | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2000-06-21 | — | — | EP | disclosed |
| EP-0965887-A1 | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-12-22 | — | — | EP | disclosed |
| EP-0949539-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0076404-A1 | Method for recovery of gallium | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1983-04-13 | — | — | EP | disclosed |