SCHEMBL3817522

SCHEMBL3817522

CCC1(CC)CCC[Si](C)(C)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28574695 0.79 SIRT2 (0.34)
SCHEMBL28237233 0.77 SIRT2 (0.42)
SCHEMBL1130858 0.76
SCHEMBL28534983 0.76
SCHEMBL9251958 0.74 SIRT2 (0.30)
SCHEMBL8025784 0.74
SCHEMBL10835213 0.72
SCHEMBL19085008 0.72
SCHEMBL11589015 0.71
SCHEMBL28043700 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024134509-A1 METHOD OF MODIFYING PARTICLES USING A CASCADE PLASMA REACTOR TECHNOLOGY INNOVATION INSTITUTE - SOLE PROPRIETORSHIP LLC (AE) 2024-06-27 WO claimed
US-20240198312-A1 METHOD OF MODIFYING PARTICLES USING A CASCADE PLASMA REACTOR TECHNOLOGY INNOVATION INSTITUTE-SOLE PROPRIETORSHIP LLC (AE) 2024-06-20 US claimed
EP-4066063-A1 TONER FOR DEVELOPING ELECTROSTATIC IMAGE Hewlett-Packard Development Company, L.P. (US) 2022-10-05 EP claimed
US-20220206406-A1 TONER FOR DEVELOPING ELECTROSTATIC IMAGE HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2022-06-30 US claimed
WO-2021108004-A1 TONER FOR DEVELOPING ELECTROSTATIC IMAGE HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-06-03 WO claimed
EP-2052097-B1 PLASMA SURFACE TREATMENT USING DIELECTRIC BARRIER DISCHARGES TEKNA PLASMA SYSTEMS INC (CA) 2016-12-07 EP claimed
US-8263178-B2 in-flight surface treatment of powders using a Dielectric Barrier Discharge Torch operating at atmospheric pressures or soft vacuum conditions TEKNA PLASMA SYSTEMS INC. (CA) 2012-09-11 US claimed
EP-2052097-A1 PLASMA SURFACE TREATMENT USING DIELECTRIC BARRIER DISCHARGES Tekna Plasma Systems, Inc. (CA) 2009-04-29 EP claimed
US-20080145553-A1 PLASMA SURFACE TREATMENT USING DIELECTRIC BARRIER DISCHARGES TEKNA PLASMA SYSTEMS INC. (CA) 2008-06-19 US claimed
WO-2008014607-A1 PLASMA SURFACE TREATMENT USING DIELECTRIC BARRIER DISCHARGES TEKNA PLASMA SYSTEMS INC. (CA) 2008-02-07 WO claimed
US-20260117458-A1 METHODS AND SYSTEMS FOR PLASMA COLOURATION AND PIGMENT FIXATION XEFCO PTY LTD (AU) 2026-04-30 US disclosed
WO-2026039879-A1 METHOD AND DEVICE FOR COLOURATION OF SUBSTRATES XEFCO PTY LTD (AU) 2026-02-26 WO disclosed
US-20260035797-A1 PLASMA COATING WITH PARTICLES XEFCO PTY LTD (AU) 2026-02-05 US disclosed
US-20250258447-A1 ELECTROGRAPHIC TONERS HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2025-08-14 US disclosed
US-20250243375-A1 PRINTING MATERIAL INCLUDING SALEN COMPOUND HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2025-07-31 US disclosed
CN-105801863-A Preparation method of hydroxyl-terminated poly(diethyldimethyl)siloxane 山东大学 2016-07-27 CN disclosed
US-8263178-B2 in-flight surface treatment of powders using a Dielectric Barrier Discharge Torch operating at atmospheric pressures or soft vacuum conditions TEKNA PLASMA SYSTEMS INC. (CA) 2012-09-11 US disclosed
EP-2052097-A1 PLASMA SURFACE TREATMENT USING DIELECTRIC BARRIER DISCHARGES Tekna Plasma Systems, Inc. (CA) 2009-04-29 EP disclosed
US-20080145553-A1 PLASMA SURFACE TREATMENT USING DIELECTRIC BARRIER DISCHARGES TEKNA PLASMA SYSTEMS INC. (CA) 2008-06-19 US disclosed
WO-2008014607-A1 PLASMA SURFACE TREATMENT USING DIELECTRIC BARRIER DISCHARGES TEKNA PLASMA SYSTEMS INC. (CA) 2008-02-07 WO disclosed