SCHEMBL3818052

SCHEMBL3818052

[CH2]C(=O)NNCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19639641 0.75 HDAC3 (0.33)
SCHEMBL749123 0.73
SCHEMBL1512247 0.73
SCHEMBL1749966 0.72
SCHEMBL8379138 0.71
SCHEMBL1749997 0.71
SCHEMBL3538392 0.71
SCHEMBL17424931 0.71
SCHEMBL20355985 0.70
SCHEMBL13679866 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1872943-B1 Photosensitive composition and planographic printing plate base using same FUJIFILM CORP (JP) 2009-08-12 EP disclosed
EP-1053868-B1 Photosensitive composition and planographic printing plate base using same FUJIFILM CORP (JP) 2008-02-06 EP disclosed
EP-1872943-A2 Photosensitive composition and planographic printing plate base using same FUJIFILM Corporation (JP) 2008-01-02 EP disclosed
EP-1059164-B1 Image recording material and planographic printing plate using same FUJI PHOTO FILM CO LTD (JP) 2006-04-19 EP disclosed
EP-0945264-B1 Anionic infrared-ray absorbing agent, photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO LTD (JP) 2003-09-24 EP disclosed
US-6602645-B1 Macromolecular compound having alkali soluble groups and metal phthalocyanine; high sensitivity; good developing latitude; storage stability; direct positive-type FUJI PHOTO FILM CO., LTD. (JP) 2003-08-05 US disclosed
US-6444393-B2 AN ANIONIC INFRARED ABSORBING AGENT AND A POLYMERIC COMPOUND THAT IS WATER INSOLUBLE BUT SOLUBLE IN AQUEOUS ALKALINE SOLUTION WHEN IRRADIATED WITH RADIATION FUJI PHOTO FILM CO., LTD. (JP) 2002-09-03 US disclosed
US-6383714-B1 COMPOUNDS DECOMPOSABLE BY LIGHT AND HEAT, CROSSLINKING, INFRARED ABSORBERS FUJI PHOTO FILM CO., LTD. (JP) 2002-05-07 US disclosed
US-20010003639-A1 An anionic infrared absorbing agent and a polymeric compound that is water insoluble but soluble in aqueous alkaline solution when irradiated with radiation TATSUO NAKAMURA 2001-06-14 US disclosed
EP-1059164-A2 Image recording material and planographic printing plate using same FUJI PHOTO FILM CO., LTD. (JP) 2000-12-13 EP disclosed
EP-0822447-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 2000-10-11 EP disclosed
EP-0726498-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1999-12-15 EP disclosed
EP-0945264-A1 Anionic infrared-ray absorbing agent, photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO., LTD. (JP) 1999-09-29 EP disclosed
US-5939465-A COMPRISING N-HETEROCYCLE COMPOUND, COMPOUND CONTAINING AT LEAST ONE ADDITION-POLYMERIZABLE, ETHYLENICALLY UNSATURATED BOND, AND COMPOUND WHICH GENERATES AN ACTIVE RADICAL UPON IRRADIATION OF LIGHT FUJI PHOTO FILM CO., LTD. (JP) 1999-08-17 US disclosed
US-5837748-A THIAZOLYLIDENE DERIVATIVE PHOTOINITIATOR; VISIBLE LIGHT PHOTOSENSITIVITY; PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1998-11-17 US disclosed
EP-0710887-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1998-07-29 EP disclosed
EP-0822447-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1998-02-04 EP disclosed
US-5609992-A UNSATURATED COMPOUND AND A THIAZOLONE PHOTOSENSITIZER FUJI PHOTO FILM CO., LTD. (JP) 1997-03-11 US disclosed
EP-0726498-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1996-08-14 EP disclosed
EP-0710887-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1996-05-08 EP disclosed