⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL117041 | 0.97 | — | — | |
| SCHEMBL8505514 | 0.97 | — | — | |
| SCHEMBL292033 | 0.97 | — | — | |
| SCHEMBL22607615 | 0.94 | — | — | |
| SCHEMBL9806337 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL7265606 | 0.94 | — | — | |
| Methylamine SCHEMBL3638550 | 0.94 | — | — | |
| Acetic Acid SCHEMBL27517240 | 0.89 | CA1 (0.38) | — | |
| Formic Acid SCHEMBL28494573 | 0.87 | CA1 (0.37) | — | |
| SCHEMBL7432108 | 0.85 | CA1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0124274-B1 | ELECTRON BEAM SENSITIVE MIXTURE RESIST | GAF CORPORATION (US) | 1988-06-22 | — | — | EP | claimed |
| EP-0088977-B1 | ELECTRON BEAM SENSITIVE RESIST | GAF CORPORATION (US) | 1988-06-01 | — | — | EP | claimed |
| EP-0126652-B1 | ELECTRON BEAM SENSITIVE MIXTURE RESIST | GAF CORPORATION (US) | 1987-04-22 | — | — | EP | claimed |
| EP-0126652-A1 | Electron beam sensitive mixture resist | GAF CORPORATION (US) | 1984-11-28 | — | — | EP | claimed |
| EP-0124274-A2 | Electron beam sensitive mixture resist | GAF CORPORATION (US) | 1984-11-07 | — | — | EP | claimed |
| US-4448875-A | HALF-ESTER OR -AMIDE OF ALKYL VINYL ETHER-MALEIC ANHYDRIDE COPOLYMER | GAF CORPORATION (US) | 1984-05-15 | — | — | US | claimed |
| EP-0088977-A2 | Electron beam sensitive resist | GAF CORPORATION (US) | 1983-09-21 | — | — | EP | claimed |
| US-4375398-A | CROSSLINKING, VINYL ETHER | GAF CORPORATION (US) | 1983-03-01 | — | — | US | claimed |
| CN-101534851-B | Methods and compositions for promoting organ development | KINTAN PTY LTD | 2015-03-04 | — | — | CN | disclosed |
| EP-2099806-A1 | SPIROPIPERIDINE DERIVATIVES AS NK3 ANTAGONISTS | F. Hoffmann-Roche AG (CH) | 2009-09-16 | — | — | EP | disclosed |
| CN-101534851-A | Methods and compositions for promoting organ development | KINTAN PTY LTD (AU) | 2009-09-16 | — | — | CN | disclosed |
| WO-2008081012-A1 | SPIROPIPERIDINE DERIVATIVES AS NK3 ANTAGONISTS | F. HOFFMANN-LA ROCHE AG (CH) | 2008-07-10 | — | — | WO | disclosed |
| EP-0124274-B1 | ELECTRON BEAM SENSITIVE MIXTURE RESIST | GAF CORPORATION (US) | 1988-06-22 | — | — | EP | disclosed |
| EP-0088977-B1 | ELECTRON BEAM SENSITIVE RESIST | GAF CORPORATION (US) | 1988-06-01 | — | — | EP | disclosed |
| EP-0126652-A1 | Electron beam sensitive mixture resist | GAF CORPORATION (US) | 1984-11-28 | — | — | EP | disclosed |
| EP-0124274-A2 | Electron beam sensitive mixture resist | GAF CORPORATION (US) | 1984-11-07 | — | — | EP | disclosed |
| US-4448876-A | Electron beam sensitive resist | GAF CORPORATION (US) | 1984-05-15 | — | — | US | disclosed |
| US-4448875-A | HALF-ESTER OR -AMIDE OF ALKYL VINYL ETHER-MALEIC ANHYDRIDE COPOLYMER | GAF CORPORATION (US) | 1984-05-15 | — | — | US | disclosed |
| EP-0088977-A2 | Electron beam sensitive resist | GAF CORPORATION (US) | 1983-09-21 | — | — | EP | disclosed |
| US-4375398-A | CROSSLINKING, VINYL ETHER | GAF CORPORATION (US) | 1983-03-01 | — | — | US | disclosed |