SCHEMBL3837756

SCHEMBL3837756

C[C@@](N)(CS)C(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2928356 1.00
SCHEMBL2928353 1.00
Hydrochloric Acid SCHEMBL2927837 0.97
Hydrochloric Acid SCHEMBL2927841 0.97
SCHEMBL62881 0.78
SCHEMBL21663995 0.78
SCHEMBL64140 0.78
SCHEMBL62882 0.78
SCHEMBL18882997 0.78
Hydrochloric Acid SCHEMBL1132932 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1686114-B1 PROCESS FOR PRODUCING OPTICALLY ACTIVE 2-ALKYLCYSTEINE, DERIVATIVE THEREOF, AND PROCESSES FOR PRODUCTION MITSUBISHI GAS CHEMICAL CO (JP) 2009-10-07 EP disclosed
US-20090030210-A1 Process for Producing Optically Active 2-Alkylcysteine, Derivative Thereof, and Processes for Production MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-01-29 US disclosed
US-7470525-B2 Process for producing optically active 2-alkycysteine, derivative thereof, and processes for production MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-12-30 US disclosed
US-20070037260-A1 allowing cells of microorganism or treated products thereof having an activity of stereoselective hydrolysis of the amide bond of a 2-alkyl-L-cysteinamide or a salt thereof to act on a 2-alkylcysteinamide consisting of a mixture of D- and L-isomers or a salt thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-02-15 US disclosed
EP-1686114-A1 PROCESS FOR PRODUCING OPTICALLY ACTIVE 2-ALKYLCYSTEINE, DERIVATIVE THEREOF, AND PROCESSES FOR PRODUCTION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-08-02 EP disclosed