SCHEMBL3839155

SCHEMBL3839155

O=C(c1ccc(C(=O)c2ccccc2Br)cc1)c1ccc(C(=O)c2ccccc2Br)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK13 O15264 1/20 0.58
MAPK12 P53778 1/20 0.58
MAPK11 Q15759 1/20 0.58
MAPK14 Q16539 1/20 0.58
AKR1C3 P42330 3/20 0.57
ALDH1A1 P00352 3/20 0.50
KMT2A Q03164 2/20 0.50
LIG1 P18858 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.49
CDC25B P30305 1/20 0.48
ATM Q13315 1/20 0.48
SRD5A2 P31213 1/20 0.48
NR4A1 P22736 1/20 0.47
GAA P10253 1/20 0.47
MAPT P10636 1/20 0.47
TP53 P04637 1/20 0.46
MEN1 O00255 1/20 0.46
KCNH2 Q12809 1/20 0.45
CYP1A2 P05177 1/20 0.44
CYP2D6 P10635 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3842158 0.93 AKR1C3 (0.60) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL3677894 0.91 AKR1C3 (0.69) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL723657 0.91 AKR1C3 (0.61) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL29913321 0.91 AKR1C3 (0.61) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL20157913 0.90 LIG1 (0.66) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL6654918 0.88 MAPK13 (0.60) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL9281265 0.88 NR4A1 (0.65) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL29928911 0.88 NR4A1 (0.65) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL3597584 0.88 TP53 (0.54) MAPK13MAPK12MAPK11MAPK14AKR1C3
SCHEMBL6404312 0.88 CDC25B (0.67) MAPK13MAPK12MAPK11MAPK14AKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6884862-B2 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2005-04-26 US claimed
US-7556860-B2 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2009-07-07 US disclosed
EP-1245638-B1 Composition for insulating film formation JSR CORP (JP) 2009-01-14 EP disclosed
EP-1298176-B1 Stacked film insulating film and substrate for semiconductor JSR CORP (JP) 2007-01-03 EP disclosed
US-20060216531-A1 Laminate and method of forming the same, insulating film, and semiconductor device JSR CORPORATION (JP) 2006-09-28 US disclosed
US-20060210812-A1 Insulating film and method of forming the same JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1696478-A1 INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-08-30 EP disclosed
EP-1679184-A1 LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-07-12 EP disclosed
US-6884862-B2 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2005-04-26 US disclosed
US-6852370-B2 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2005-02-08 US disclosed
US-6824833-B2 STACKED DIELECTRIC JSR CORPORATION (JP) 2004-11-30 US disclosed
EP-1254917-B1 Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film JSR CORP (JP) 2004-06-30 EP disclosed
US-20030077461-A1 Stacked film, insulating film and substrate for semiconductor JSR CORPORATION (JP) 2003-04-24 US disclosed
EP-1298176-A2 Stacked film insulating film and substrate for semiconductor JSR Corporation (JP) 2003-04-02 EP disclosed
US-20020172652-A1 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2002-11-21 US disclosed
EP-1254917-A1 Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film JSR Corporation (JP) 2002-11-06 EP disclosed
US-20020161173-A1 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2002-10-31 US disclosed
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020172652-A1 Composition for film formation and material for insulating film formation VCL, BMI1, PUF60 MAPK13 1921/4885MAPK12 2395/4885MAPK11 1713/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.