⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1399460 | 0.83 | CYP3A4 (0.38) | — | |
| SCHEMBL1174131 | 0.80 | — | — | |
| SCHEMBL14076880 | 0.80 | — | — | |
| SCHEMBL1174132 | 0.80 | — | — | |
| SCHEMBL8051039 | 0.79 | TSHR (0.33) | — | |
| SCHEMBL9999634 | 0.79 | — | — | |
| SCHEMBL7872083 | 0.78 | — | — | |
| SCHEMBL24043822 | 0.76 | — | — | |
| SCHEMBL13137631 | 0.76 | — | — | |
| SCHEMBL7403472 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 212 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1096317-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-09-08 | — | — | EP | claimed |
| EP-1150166-B1 | Polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-12-19 | — | — | EP | claimed |
| US-6667145-B1 | Resist composition comprising as a base resin a polymer having highly adherent, highly rigid units and especially suited as micropatterning material for VLSI fabrication, and (2) a patterning process using the resist | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-23 | — | — | US | claimed |
| US-6596463-B2 | Photosensitivity, resolution, chemical resistance | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2003-07-22 | — | — | US | claimed |
| US-6566038-B2 | Micropatterning using electron beams or ultraviolet rays | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-20 | — | — | US | claimed |
| US-20230212355-A1 | METHOD FOR PREPARING POLYHYDROXYURETHANE, POLYHYDROXYURETHANE PREPARED USING THE METHOD AND PRESSURE-SENSITIVE ADHESIVE COMPRISING THE POLYHYDROXYURETHANE | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2023-07-06 | — | — | US | disclosed |
| US-20230212355-A1 | METHOD FOR PREPARING POLYHYDROXYURETHANE, POLYHYDROXYURETHANE PREPARED USING THE METHOD AND PRESSURE-SENSITIVE ADHESIVE COMPRISING THE POLYHYDROXYURETHANE | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2023-07-06 | — | — | US | disclosed |
| US-20220413385-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2022-12-29 | — | — | US | disclosed |
| US-10723836-B2 | Hydrocarbon polymers comprising two exo-vinylene cyclic carbonate terminal groups | BOSTIK SA (FR) | 2020-07-28 | — | — | US | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-20180072842-A1 | HYDROCARBON POLYMERS COMPRISING TWO EXO-VINYLENE CYCLIC CARBONATE TERMINAL GROUPS | BOSTIK SA (FR) | 2018-03-15 | — | — | US | disclosed |
| WO-2017156132-A1 | NON-ISOCYANATE POLYURETHANE INKS FOR 3D PRINTING | 3D SYSTEMS, INCORPORATED (US) | 2017-09-14 | — | — | WO | disclosed |
| EP-1096318-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-1096317-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-1085377-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1053985-A1 | Resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2000-11-22 | — | — | EP | disclosed |
| US-6147249-A | ESTER COMPOUND CAPABLE OF FORMING ACID-DECOMPOSABLE POLYMER WHICH CAN BE BLENDED AS BASE RESIN TO FORMULATE RESIST COMPOSITION HAVING HIGHER SENSITIVITY, RESOLUTION AND ETCHING RESISTANCE THAN CONVENTIONAL RESIST COMPOSITIONS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-11-14 | — | — | US | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |
| WO-1997005140-A1 | TRINDENE COMPOUNDS | NOVARTIS AG (CH) | 1997-02-13 | — | — | WO | disclosed |