Methyl Alcohol

Methyl Alcohol

SCHEMBL3839631

CO.[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[O-]B([O-])[O-].[O-]B([O-])[O-].[O-]B([O-])[O-].[O-]B([O-])[O-]

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Methyl Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methyl Alcohol SCHEMBL7907560 1.00 TSHR (0.38) TSHR
Methyl Alcohol SCHEMBL28861634 0.88
Hydrogen Peroxide SCHEMBL28948767 0.80
Lithium Ion SCHEMBL6853759 0.80
Lithium Ion SCHEMBL27817938 0.79
Lithium Ion SCHEMBL36841 0.79
Lithium Ion SCHEMBL3464915 0.79
Lithium Ion SCHEMBL136948 0.79
Lithium Ion SCHEMBL7563428 0.72
Lithium Ion SCHEMBL16506716 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090211640-A1 Electron injecting layer including superacid salt, lithium salt or mixture thereof, photovoltaic device including the electron injecting layer, method of manufacturing the photovoltaic device, and organic light-emitting device including the electron injecting layer SAMSUNG MOBILE DISPLAY CO., LTD., A CORPORATION CHARTERED IN AND EXISTING UNDER THE LAWS OF THE REPUBLIC OF KOREA (KR) 2009-08-27 US disclosed