Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SRD5A2 | P31213 | 5/20 | 0.49 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.47 |
| ▸ | STS | P08842 | 2/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | BCL2 | P10415 | 3/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.43 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.43 |
| ▸ | BAD | Q92934 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | ELANE | P08246 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1501381 | 0.94 | CTNNB1 (0.51) | SRD5A2CTNNB1STSPOLBKMT2A | |
| SCHEMBL3845199 | 0.90 | CTNNB1 (0.53) | CTNNB1PARP10KMT2AELANERAB9A | |
| SCHEMBL10448654 | 0.88 | SRD5A2 (0.62) | SRD5A2CTNNB1STSPOLBBCL2 | |
| SCHEMBL3845279 | 0.87 | POLB (0.50) | SRD5A2CTNNB1STSPOLBBCL2 | |
| SCHEMBL3841646 | 0.86 | CTNNB1 (0.46) | SRD5A2CTNNB1STSPOLBBCL2 | |
| SCHEMBL9419499 | 0.85 | SRD5A2 (0.58) | SRD5A2CTNNB1STSPOLBELANE | |
| SCHEMBL29575432 | 0.84 | CTNNB1 (0.65) | SRD5A2CTNNB1STSBCL2MCL1 | |
| SCHEMBL8746846 | 0.84 | CTNNB1 (0.65) | SRD5A2CTNNB1STSBCL2MCL1 | |
| SCHEMBL7758624 | 0.84 | PARP10 (0.54) | SRD5A2CTNNB1STSPOLBBCL2 | |
| SCHEMBL3838678 | 0.84 | AKR1C3 (0.56) | SRD5A2CTNNB1STSPOLBBCL2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6884862-B2 | Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film | JSR CORPORATION (JP) | 2005-04-26 | — | — | US | claimed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| US-20060210812-A1 | Insulating film and method of forming the same | JSR CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1696478-A1 | INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-08-30 | — | — | EP | disclosed |
| EP-1679184-A1 | LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-6884862-B2 | Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film | JSR CORPORATION (JP) | 2005-04-26 | — | — | US | disclosed |
| US-6852370-B2 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2005-02-08 | — | — | US | disclosed |
| US-6824833-B2 | STACKED DIELECTRIC | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| EP-1254917-B1 | Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film | JSR CORP (JP) | 2004-06-30 | — | — | EP | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1254917-A1 | Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film | JSR Corporation (JP) | 2002-11-06 | — | — | EP | disclosed |
| US-20020161173-A1 | Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-10-31 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | VCL, BMI1, PUF60 | SRD5A2 4015/4885CTNNB1 652/4885STS 4039/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.