⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1485551 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL28461710 | 0.97 | — | — | |
| SCHEMBL19670019 | 0.83 | — | — | |
| SCHEMBL1485756 | 0.82 | — | — | |
| SCHEMBL15580361 | 0.82 | — | — | |
| SCHEMBL386584 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL3309343 | 0.80 | — | — | |
| SCHEMBL386971 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL3309344 | 0.80 | — | — | |
| SCHEMBL8301881 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103717589-B | For treating or prevent the compound of respiratory syncytial virus disease | 弗·哈夫曼-拉罗切有限公司 | 2016-08-17 | — | — | CN | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-8541534-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| EP-2565046-A2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate | Fujifilm Corporation (JP) | 2013-03-06 | — | — | EP | disclosed |
| US-20130047878-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| EP-2301750-B1 | Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same | FUJIFILM CORP (JP) | 2012-10-31 | — | — | EP | disclosed |
| CN-102540712-A | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORP | 2012-07-04 | — | — | CN | disclosed |
| US-7199150-B2 | Amino alcohol compounds | SANKYO COMPANY, LIMITED (JP) | 2007-04-03 | — | — | US | disclosed |
| EP-1669348-A1 | NOVEL ANTIFUNGAL AGENT COMPRISING HETEROCYCLIC COMPOUND | Eisai Co., Ltd. (JP) | 2006-06-14 | — | — | EP | disclosed |
| US-6964976-B2 | Amino alcohol derivatives | SANKYO COMPANY, LIMITED (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20050043386-A1 | Amino alcohol derivatives or phosphonic acid derivatives and pharmaceutical compositions containing these | SANKYO COMPANY, LIMITED (JP) | 2005-02-24 | — | — | US | disclosed |
| EP-1471054-A1 | AMINO ALCOHOL DERIVATIVE OR PHOSPHONIC ACID DERIVATIVE AND MEDICINAL COMPOSITION CONTAINING THESE | Sankyo Company, Limited (JP) | 2004-10-27 | — | — | EP | disclosed |
| US-6723745-B2 | PREVENTION OR TREATMENT OF AUTOIMMUNE DISEASE IN WARM BLOODED ANIMAL | SANKYO COMPANY, LIMITED (JP) | 2004-04-20 | — | — | US | disclosed |
| US-20030236297-A1 | Amino alcohol derivatives | SANKYO COMPANY, LIMITED (JP) | 2003-12-25 | — | — | US | disclosed |
| EP-1300405-A1 | AMINO ALCOHOL DERIVATIVES | Sankyo Company, Limited (JP) | 2003-04-09 | — | — | EP | disclosed |
| CN-1184423-A | Nodulisporic acid derivatives | MERCK & CO INC (US) | 1998-06-10 | — | — | CN | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |