⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22509 | 0.97 | — | — | |
| SCHEMBL22508 | 0.97 | — | — | |
| SCHEMBL1760721 | 0.97 | — | — | |
| Propene SCHEMBL5668841 | 0.93 | — | — | |
| SCHEMBL1273903 | 0.93 | TSHR (0.30) | — | |
| SCHEMBL8523342 | 0.93 | — | — | |
| SCHEMBL1273905 | 0.93 | TSHR (0.30) | — | |
| SCHEMBL8523340 | 0.93 | — | — | |
| Propene SCHEMBL5668847 | 0.93 | — | — | |
| Ethylene SCHEMBL11038333 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4065257-A | ORGANIC AMINO COMPOUNDS | CIBA-GEIGY CORPORATION (US) | 1977-12-27 | — | — | US | claimed |
| US-9110371-B2 | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing wiring board | HITACHI CHEMICAL COMPANY, LTD (JP) | 2015-08-18 | — | — | US | disclosed |
| US-20150153647-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR PRODUCING WIRING BOARD | RESONAC CORPORATION (JP) | 2015-06-04 | — | — | US | disclosed |
| EP-2857899-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING WIRING BOARD | Hitachi Chemical Company, Ltd. (JP) | 2015-04-08 | — | — | EP | disclosed |
| JP-2009013311-A | RUBBER COMPOSITION | TOYO TIRE & RUBBER CO LTD | 2009-01-22 | — | — | JP | disclosed |
| US-4186119-A | Polyurethanes prepared from alcohols and hydrocarbon polyisocyanates used in textile wet treatment processes | SANDOZ LTD. (CH) | 1980-01-29 | — | — | US | disclosed |
| US-4065257-A | ORGANIC AMINO COMPOUNDS | CIBA-GEIGY CORPORATION (US) | 1977-12-27 | — | — | US | disclosed |