SCHEMBL3873458

SCHEMBL3873458

Oc1ccc(CCc2ccc(CCc3ccc(O)cc3)cc2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 1.00
ESR2 Q92731 2/20 1.00
LTA4H P09960 1/20 0.74
CA2 P00918 2/20 0.72
ALDH1A1 P00352 4/20 0.68
KDM4E B2RXH2 3/20 0.68
ADRA2A P08913 3/20 0.68
SLC6A2 P23975 3/20 0.68
HTR1A P08908 1/20 0.68
CYP2C19 P33261 1/20 0.68
HTR3A P46098 1/20 0.68
BACE1 P56817 1/20 0.68
TAAR1 Q96RJ0 1/20 0.68
L3MBTL1 Q9Y468 1/20 0.68
BLM P54132 2/20 0.65
KMT2A Q03164 2/20 0.65
TDP1 Q9NUW8 1/20 0.65
TMEM97 Q5BJF2 1/20 0.59
SIGMAR1 Q99720 1/20 0.59
ABAT P80404 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL69344 1.00 ESR1 (1.00) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL28638329 0.91 ESR1 (0.82) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL717373 0.88 ESR1 (0.78) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL245139 0.87 ESR1 (0.77) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL449737 0.87 ESR1 (0.77) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL1171041 0.87 ESR1 (0.77) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL7067875 0.86 ESR1 (0.74) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL11854381 0.86 ESR1 (0.74) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL5647781 0.86 ESR1 (0.74) ESR1ESR2LTA4HCA2ALDH1A1
SCHEMBL21632756 0.86 ESR1 (0.74) ESR1ESR2LTA4HCA2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2016463-A1 COMPOSITION FOR POSITIVE TYPE PHOTORESIST AND POSITIVE TYPE PHOTORESIST FILM MANUFACTURED THEREBY KOLON INDUSTRIES, INC. (KR) 2009-01-21 EP claimed
WO-2007119949-A1 COMPOSITION FOR POSITIVE TYPE PHOTORESIST AND POSITIVE TYPE PHOTORESIST FILM MANUFACTURED THEREBY KOLON INDUSTRIES, INC (KR) 2007-10-25 WO claimed
US-3935101-A LIGNIN-DIEPOXIDE REACTION PRODUCT GEORGIA-PACIFIC CORPORATION (US) 1976-01-27 US claimed
CN-111801225-B Thermosensitive recording medium 日本制纸株式会社 2022-11-08 CN disclosed
US-9776952-B2 Polymerisable compounds and the use thereof in liquid-crystal media and liquid-crystal displays MERCK PATENT GMBH (DE) 2017-10-03 US disclosed
US-9567285-B2 Polymerisable compounds and the use thereof in liquid-crystal media and liquid-crystal displays MERCK PATENT GMBH (DE) 2017-02-14 US disclosed
US-7045276-B2 Capable of forming high-quality images with no stains in the non-image area thereof FUJI PHOTO FILM CO., LTD. (JP) 2006-05-16 US disclosed
US-4757129-A Polycarbonates PPG INDUSTRIES, INC. (US) 1988-07-12 US disclosed
US-3935101-A LIGNIN-DIEPOXIDE REACTION PRODUCT GEORGIA-PACIFIC CORPORATION (US) 1976-01-27 US disclosed