Acetic Acid

Acetic Acid

SCHEMBL3883987

CC(=O)O.CC=Cc1ccccc1

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.61
TDP1 Q9NUW8 1/20 0.61
HDAC1 Q13547 3/20 0.54
HDAC3 O15379 2/20 0.54
HDAC4 P56524 2/20 0.54
HDAC2 Q92769 2/20 0.54
HDAC8 Q9BY41 2/20 0.54
HDAC6 Q9UBN7 2/20 0.54
PLIN1 O60240 2/20 0.54
LMNA P02545 2/20 0.54
MAPT P10636 2/20 0.54
RECQL P46063 2/20 0.54
PLIN5 Q00G26 2/20 0.54
ABHD5 Q8WTS1 2/20 0.54
ALDH1A1 P00352 2/20 0.54
TNKS O95271 1/20 0.54
HCAR2 Q8TDS4 1/20 0.54
HDAC7 Q8WUI4 1/20 0.54
HDAC10 Q969S8 1/20 0.54
HDAC11 Q96DB2 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL3883980 1.00 GLA (0.61) GLATDP1HDAC1HDAC3HDAC4
Acetone SCHEMBL28318720 0.95 GLA (0.61) GLATDP1HDAC1HDAC3HDAC4
Bicarbonate SCHEMBL10585721 0.93 GLA (0.58) GLATDP1HDAC1HDAC3HDAC4
Acetamide SCHEMBL11419950 0.91 GLA (0.57) GLATDP1HDAC1HDAC3HDAC4
Acetic Acid SCHEMBL27975703 0.89 GLA (0.55) GLATDP1HDAC1HDAC3HDAC4
Methyl Alcohol SCHEMBL10861893 0.87 MAOB (0.52) GLATDP1HDAC1HDAC3HDAC4
(Z)-1,2-Diphenylethene SCHEMBL7706161 0.87 GLA (0.70) GLATDP1HDAC1HDAC3HDAC4
(Z)-1,2-Diphenylethene SCHEMBL7706163 0.87 GLA (0.70) GLATDP1HDAC1HDAC3HDAC4
Benzene SCHEMBL1225180 0.87 MAOB (0.58) GLATDP1HDAC1HDAC3HDAC4
SCHEMBL2342 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102692819-A Photosensitive resin composite and liquid crystal board TOKYO OHKA KOGYO CO LTD 2012-09-26 CN disclosed
CN-101405657-B Photosensitive composition, photosensitive film, permanent pattern forming method, and printed board FUJI PHOTO FILM CO LTD 2012-01-18 CN disclosed
CN-101644893-A Photosensitive composition, photosensitive film, photosensitive laminated body, permanent patterning method and printed circuit board FUJI PHOTO FILM CO LTD JP 2010-02-10 CN disclosed
CN-101627338-A Photosensitive composition, photosensitive film, method for formation of permanent pattern, and print substrate FUJIFILM CORP 2010-01-13 CN disclosed
EP-2138054-A1 Plant extract for the prevention or treatment of snoring and/or sleep apnoea Cariel, Léon (FR) 2009-12-30 EP disclosed
CN-101533221-A Light-sensitive composition, light-sensitive film, light-sensitive laminated body, permanent pattern forming method and printing circuit board FUJIFILM INVEST CO LTD 2009-09-16 CN disclosed
CN-101405657-A Photosensitive composition, photosensitive film, permanent pattern forming method, and printed board FUJIFILM CORP (JP) 2009-04-08 CN disclosed
CN-101398620-A Photosensitive composition, photosensitive film, photosensitive laminated body, permanent pattern forming method and printed circuit board FUJIFILM CORP (JP) 2009-04-01 CN disclosed
CN-100470366-C Polymeric composition and lithographic printing platemaking forebody FUJI PHOTO FILM CO LTD (JP) 2009-03-18 CN disclosed
CN-101149562-A Photosensitive composition, photosensitive film, permanent pattern forming method and printing circuit board FUJIFILM CORP (JP) 2008-03-26 CN disclosed
CN-1235089-C Photosensitive lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 2006-01-04 CN disclosed
CN-1495524-A Polymeric composition and lithographic printing platemaking forebody 富士胶片株式会社 2004-05-12 CN disclosed
CN-1355448-A Photosensitive lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 2002-06-26 CN disclosed