Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL977426 | 0.60 | — | — | |
| Carbon Dioxide SCHEMBL25272012 | 0.54 | — | — | |
| SCHEMBL1702393 | 0.53 | — | — | |
| SCHEMBL9557664 | 0.53 | — | — | |
| SCHEMBL28621 | 0.50 | — | — | |
| SCHEMBL3292582 | 0.50 | — | — | |
| SCHEMBL1325641 | 0.50 | — | — | |
| SCHEMBL706081 | 0.50 | — | — | |
| SCHEMBL5919405 | 0.50 | — | — | |
| SCHEMBL10353878 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1895576-B1 | PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2014-07-23 | — | — | EP | claimed |
| US-7932013-B2 | Pattern coating material and pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-26 | — | — | US | claimed |
| EP-3275527-B1 | GAS-PERMEABLE MEMBRANE, USE OF A COMPOSITION FOR FORMING SUCH MEMBRANE AND PROCESS FOR PRODUCING IT | NANOMEMBRANE TECH INC (JP) | 2023-10-11 | — | — | EP | disclosed |
| US-10751672-B2 | Gas-permeable membrane | NanoMembrane Technologies, Inc. (JP) | 2020-08-25 | — | — | US | disclosed |
| EP-3275527-A1 | GAS-PERMEABLE MEMBRANE | NanoMembrane Technologies, Inc. (JP) | 2018-01-31 | — | — | EP | disclosed |
| US-20180021738-A1 | GAS-PERMEABLE MEMBRANE | NanoMembrane Technologies, Inc. (JP) | 2018-01-25 | — | — | US | disclosed |
| EP-2131423-B1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-9796879-B2 | Film-forming material | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-24 | — | — | US | disclosed |
| US-9405199-B2 | Method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9105929-B2 | Negative electrode base member | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20150184047-A1 | METHOD FOR MODIFYING SUBSTRATE SURFACE, MODIFYING FILM AND COATING SOLUTION USED FOR MODIFICATION OF SUBSTRATE SURFACE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-02 | — | — | US | disclosed |
| US-20090286936-A1 | COMPOSITION FOR FORMATION OF MOLD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090134119-A1 | FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090087625-A1 | METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090061170-A1 | ANISOTROPIC FILM AND METHOD OF MANUFACTURING ANISOTROPIC FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090029284-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| EP-1895576-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-05 | — | — | EP | disclosed |
| US-20080050564-A1 | Method of Forming a Nano-Structure and the Nano-Structure | RIKEN (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20070126147-A1 | Method of producing a nanomaterial, and a nanomaterial | RIKEN (JP) | 2007-06-07 | — | — | US | disclosed |
| EP-1767491-A1 | METHOD FOR MANUFACTURING NANOSTRUCTURE AND NANOSTRUCTURE | Riken (JP) | 2007-03-28 | — | — | EP | disclosed |