Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 8/20 | 0.63 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.38 |
| ▸ | CHRM3 | P20309 | 3/20 | 0.38 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.38 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.36 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.36 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7587514 | 0.81 | KCNN4 (0.68) | KCNN4NPSR1CYP1A2KMT2AMAPT | |
| SCHEMBL4194518 | 0.79 | KCNN4 (0.65) | KCNN4NPSR1CYP1A2KMT2AMAPT | |
| SCHEMBL4615915 | 0.78 | KCNN4 (0.44) | KCNN4NPSR1KMT2AMAPTCES1 | |
| SCHEMBL7671036 | 0.77 | KCNN4 (0.63) | KCNN4NPSR1CYP1A2KMT2AMAPT | |
| SCHEMBL30956641 | 0.77 | KCNN4 (0.63) | KCNN4NPSR1CYP1A2KMT2AMAPT | |
| SCHEMBL11080904 | 0.77 | KCNN4 (0.63) | KCNN4NPSR1CYP1A2KMT2AMAPT | |
| Triphenylacetic Acid Methyl Ester SCHEMBL7258414 | 0.77 | KCNN4 (1.00) | KCNN4NPSR1CYP1A2KMT2AMAPT | |
| SCHEMBL11080901 | 0.77 | KCNN4 (0.63) | KCNN4NPSR1CYP1A2KMT2AMAPT | |
| SCHEMBL705717 | 0.77 | KCNN4 (0.63) | KCNN4NPSR1CYP1A2KMT2AMAPT | |
| SCHEMBL20601822 | 0.76 | KCNN4 (0.61) | KCNN4NPSR1CYP1A2MAPTALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1275095-C | Novel process for preparing resists | CLARIANT INT LTD (JP) | 2006-09-13 | — | — | CN | claimed |
| CN-1239556-A | Novel process for preparing resists | CLARIANT INT LTD (CH) | 1999-12-22 | — | — | CN | claimed |
| US-12227621-B2 | Film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2025-02-18 | — | — | US | disclosed |
| US-20210395462-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2021-12-23 | — | — | US | disclosed |
| US-9500949-B2 | Chemically-amplified positive resist composition and resist patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-22 | — | — | US | disclosed |
| US-20150253664-A1 | CHEMICALLY-AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-10 | — | — | US | disclosed |
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | disclosed |
| US-7500745-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-03-10 | — | — | US | disclosed |
| US-7387380-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-06-17 | — | — | US | disclosed |
| US-20070160927-A1 | Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith | SPANSION LLC | 2007-07-12 | — | — | US | disclosed |
| US-20060274136-A1 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2006-12-07 | — | — | US | disclosed |
| EP-0801329-B1 | RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM | CLARIANT FINANCE BVI LTD (VG) | 2002-03-27 | — | — | EP | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| US-20010024765-A1 | Novel process for preparing resists | MERCK PATENT GMBH (DE) | 2001-09-27 | — | — | US | disclosed |
| US-6284427-B1 | Process for preparing resists | CLARIANT FINANCE (BVI) LIMITED (VG) | 2001-09-04 | — | — | US | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |
| US-6110639-A | Radiation-sensitive composition and recording medium using the same | HOECHST JAPAN LIMITED (JP) | 2000-08-29 | — | — | US | disclosed |
| CN-1239556-A | Novel process for preparing resists | CLARIANT INT LTD (CH) | 1999-12-22 | — | — | CN | disclosed |
| EP-0942329-A1 | NOVEL PROCESS FOR PREPARING RESISTS | Clariant International Ltd. (CH) | 1999-09-15 | — | — | EP | disclosed |
| EP-0801329-A1 | RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM | HOECHST JAPAN LIMITED (JP) | 1997-10-15 | — | — | EP | disclosed |