⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL115906 | 0.83 | — | — | |
| SCHEMBL17158623 | 0.83 | — | — | |
| SCHEMBL365613 | 0.78 | — | — | |
| SCHEMBL408236 | 0.75 | — | — | |
| SCHEMBL20574584 | 0.73 | — | — | |
| Apaflurane SCHEMBL4605919 | 0.71 | — | — | |
| SCHEMBL316386 | 0.69 | — | — | |
| SCHEMBL15404624 | 0.69 | — | — | |
| SCHEMBL1274333 | 0.68 | — | — | |
| SCHEMBL15404678 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11859312-B2 | Method of cleaning a group III-nitride single crystal substrate comprising cleaning a nitrogen-polar face with a detergent including a fluoroorganic compound | TOKUYAMA CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230313413-A1 | METHOD OF CLEANING GROUP III NITRIDE SINGLE CRYSTAL SUBSTRATE, AND METHOD OF PRODUCING THE SAME | TOKUYAMA CORPORATION (JP) | 2023-10-05 | — | — | US | disclosed |
| US-8529703-B2 | Cleaning agent, cleaning method and cleaning apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2013-09-10 | — | — | US | disclosed |
| US-20090229633-A1 | CLEANING AGENT, CLEANING METHOD AND CLEANING APPARATUS | TOKUYAMA METEL CORPORATION (JP) | 2009-09-17 | — | — | US | disclosed |
| US-7531495-B2 | Cleaning agent, cleaning method and cleaning apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-05-12 | — | — | US | disclosed |
| EP-1288284-B1 | CLEANING AGENT, CLEANING METHOD AND CLEANING APPARATUS | ASAHI CHEMICAL IND (JP) | 2008-10-29 | — | — | EP | disclosed |
| US-20030168079-A1 | Cleaning agent, cleaning method and cleaning apparatus | TOKUYAMA METEL CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1288284-A1 | CLEANING AGENT, CLEANING METHOD AND CLEANING APPARATUS | Asahi Kasei Kabushiki Kaisha (JP) | 2003-03-05 | — | — | EP | disclosed |