⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL137063 | 0.93 | — | — | |
| SCHEMBL5573210 | 0.93 | — | — | |
| SCHEMBL31337323 | 0.86 | — | — | |
| SCHEMBL11030471 | 0.86 | — | — | |
| Water SCHEMBL27475190 | 0.86 | — | — | |
| SCHEMBL23120283 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL9537 | 0.86 | — | — | |
| Trimethylammonium SCHEMBL10776563 | 0.86 | — | — | |
| Methane SCHEMBL5164087 | 0.86 | — | — | |
| SCHEMBL28209812 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040009883-A1 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-15 | — | — | US | claimed |
| US-20260055238-A1 | RESIN COMPOSITION FOR SEALING STATOR AND METHOD FOR DISASSEMBLING STATOR | SUMITOMO BAKELITE CO., LTD. (JP) | 2026-02-26 | — | — | US | disclosed |
| US-20250346811-A1 | PROCESSING SOLUTION, PROCESSING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-11-13 | — | — | US | disclosed |
| EP-4583371-A1 | RESIN COMPOSITION FOR SEALING STATOR, AND METHOD FOR DISASSEMBLING STATOR | Sumitomo Bakelite Co.Ltd. (JP) | 2025-07-09 | — | — | EP | disclosed |
| EP-4535617-A1 | EASY-TO-DISMANTLE ROTOR-FIXING RESIN COMPOSITION AND METHOD FOR DISMANTLING ROTOR | Sumitomo Bakelite Co.Ltd. (JP) | 2025-04-09 | — | — | EP | disclosed |
| EP-4534608-A1 | EASILY DETACHABLE THERMOSETTING RESIN COMPOSITION AND DETACHING METHOD | Sumitomo Bakelite Co., Ltd. (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-119790579-A | Sealing resin composition for stator and method for disassembling stator | 住友电木株式会社 | 2025-04-08 | — | — | CN | disclosed |
| CN-119318097-A | Resin composition for easily-detachable rotor fixing and method for detaching rotor | 住友电木株式会社 | 2025-01-14 | — | — | CN | disclosed |
| CN-119301202-A | Easily-disintegrated thermosetting resin composition and method for disintegrating | 住友电木株式会社 | 2025-01-10 | — | — | CN | disclosed |
| US-20240417648-A1 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-12-19 | — | — | US | disclosed |
| WO-2024048369-A1 | RESIN COMPOSITION FOR SEALING STATOR, AND METHOD FOR DISASSEMBLING STATOR | 住友ベークライト株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2023234341-A1 | EASY-TO-DISMANTLE ROTOR-FIXING RESIN COMPOSITION AND METHOD FOR DISMANTLING ROTOR | 住友ベークライト株式会社 | 2023-12-07 | — | — | WO | disclosed |
| WO-2023234340-A1 | EASILY DETACHABLE THERMOSETTING RESIN COMPOSITION AND DETACHING METHOD | 住友ベークライト株式会社 | 2023-12-07 | — | — | WO | disclosed |
| EP-1091254-B1 | Resist stripping composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-01-21 | — | — | EP | disclosed |
| CN-1184299-C | Photoresist cleaning composition | MITSUBISHI GAS CHEMICAL K K (JP) | 2005-01-12 | — | — | CN | disclosed |
| US-20040009883-A1 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-15 | — | — | US | disclosed |
| US-6372410-B1 | FOR USE IN PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS; FOR REMOVING RESIST RESIDUES REMAINING AFTER ETCHING OR ASHING | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-04-16 | — | — | US | disclosed |
| CN-1296064-A | Photoresist cleaning composition | MITSUBISHI GAS CHEMICAL K K (JP) | 2001-05-23 | — | — | CN | disclosed |
| EP-1091254-A2 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-04-11 | — | — | EP | disclosed |