SCHEMBL3904091

SCHEMBL3904091

Cc1ccc2nc(-c3ccc(C=Cc4ccc(-c5nc6ccc(C)cc6o5)cc4)cc3)oc2c1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 11/20 0.70
RAB9A P51151 11/20 0.70
MMP2 P08253 2/20 0.62
MMP9 P14780 2/20 0.62
MMP8 P22894 2/20 0.62
MMP13 P45452 2/20 0.62
KDM4E B2RXH2 12/20 0.61
SMN1; SMN2 Q16637 11/20 0.61
ALDH1A1 P00352 10/20 0.61
HPGD P15428 9/20 0.61
MAPT P10636 9/20 0.61
MEN1 O00255 3/20 0.61
KMT2A Q03164 3/20 0.61
TDP1 Q9NUW8 1/20 0.61
HSD17B10 Q99714 6/20 0.59
TP53 P04637 4/20 0.59
NFKB1 P19838 3/20 0.59
NFKB2 Q00653 3/20 0.59
RELA Q04206 3/20 0.59
ATM Q13315 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3904087 1.00 NPC1 (0.70) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL15681800 0.94 SMN1; SMN2 (0.70) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL12304257 0.93 NPC1 (0.62) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL12304345 0.93 NPC1 (0.65) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL12408905 0.90 NPC1 (0.84) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL11551873 0.89 NPC1 (0.81) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL385477 0.88 KDM4E (0.79) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL385476 0.88 KDM4E (0.79) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL29360251 0.88 KDM4E (0.79) NPC1RAB9AMMP2MMP9MMP8
SCHEMBL1248209 0.86 KDM4E (0.82) NPC1RAB9AMMP2MMP9MMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7615266-B2 Ink jet recording material EIKO EPSON CORPORATION (JP) 2009-11-10 US disclosed
US-20080291257-A1 INK JET RECORDING MATERIAL AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2008-11-27 US disclosed
EP-1705028-B1 Ink jet recording material SEIKO EPSON CORP (JP) 2008-05-21 EP disclosed
US-20060216443-A1 Including fumed silica and layer including colloidal silica, and backcoat layer of polyurethane resin SEIKO EPSON CORPORATION 2006-09-28 US disclosed
EP-1705028-A1 Ink jet recording material SEIKO EPSON CORPORATION (JP) 2006-09-27 EP disclosed