SCHEMBL3912938

SCHEMBL3912938

[GeH4].[Zr]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20549253 0.82
SCHEMBL4627688 0.82
SCHEMBL27813674 0.82
SCHEMBL21774937 0.82
Water SCHEMBL20573062 0.82
SCHEMBL2019682 0.71
SCHEMBL2400705 0.71
SCHEMBL29503562 0.71
SCHEMBL1038361 0.71
SCHEMBL29012346 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10597777-B2 Precursor composition containing group IV organic compound and method for forming thin film using same Eugenetech Materials Co., Ltd. (KR) 2020-03-24 US claimed
US-20180347042-A1 PRECURSOR COMPOSITION CONTAINING GROUP IV ORGANIC COMPOUND AND METHOD FOR FORMING THIN FILM USING SAME Eugenetech Materials Co., Ltd. (KR) 2018-12-06 US claimed
CN-108603046-A Including four race's organic compounds precursor composition and utilize its film forming method 有进科技材料股份有限公司 2018-09-28 CN claimed
CN-107519894-A A kind of lanthanum of modification/zirconium germanium sulfide/alumina composite photochemical catalyst 新沂市中诺新材料科技有限公司 2017-12-29 CN claimed
US-8405127-B2 Method and apparatus for fabricating a heterojunction bipolar transistor INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-03-26 US claimed
US-20090206370-A1 METHOD AND APPARATUS FOR FABRICATING A HETEROJUNCTION BIPOLAR TRANSISTOR GLOBALFOUNDRIES U.S. INC. 2009-08-20 US claimed
US-20260123041-A1 SOURCE/DRAIN REGIONS AND CONTACT PLUGS IN STACKING TRANSISTORS AND METHODS OF FORMING THE SAME TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2026-04-30 US disclosed
EP-3583149-B1 ADHESIVE COMPOSITIONS BASED ON GRAFTED RESINS LORD CORP (US) 2022-07-27 EP disclosed
US-11279861-B2 Adhesive compositions based on grafted resins LORD CORPORATION (US) 2022-03-22 US disclosed
US-10597777-B2 Precursor composition containing group IV organic compound and method for forming thin film using same Eugenetech Materials Co., Ltd. (KR) 2020-03-24 US disclosed
US-20180347042-A1 PRECURSOR COMPOSITION CONTAINING GROUP IV ORGANIC COMPOUND AND METHOD FOR FORMING THIN FILM USING SAME Eugenetech Materials Co., Ltd. (KR) 2018-12-06 US disclosed
CN-108603046-A Including four race's organic compounds precursor composition and utilize its film forming method 有进科技材料股份有限公司 2018-09-28 CN disclosed
US-20180244965-A1 ADHESIVE COMPOSITION AND METHOD FOR BONDING LORD CORPORATION (US) 2018-08-30 US disclosed
EP-0102695-A2 Improved dentifrice preparations comprising calcined kaolin abrasives INDIANA UNIVERSITY FOUNDATION (US) 1984-03-14 EP disclosed
US-4428928-A TALC TO IMPROVE RHEOLOGY INDIANA UNIVERSITY FOUNDATION (US) 1984-01-31 US disclosed
US-4425322-A Dual-action dentifrice COLGATE-PALMOLIVE COMPANY (US) 1984-01-10 US disclosed
US-4122163-A ANTICARIOGENIC INDIANA UNIVERSITY FOUNDATION (US) 1978-10-24 US disclosed
US-4117109-A CALCIUM PYROPHOSPHATE AND DETERGENT, REDUCED ABRASION INDIANA UNIVERSITY FOUNDATION (US) 1978-09-26 US disclosed
US-4108981-A ANTICARIES AGENTS INDIANA UNIVERSITY FOUNDATION (US) 1978-08-22 US disclosed
US-4108979-A DENTIFRICE PREPARATIONS COMPRISING ALUMINUM AND A COMPATIBLE ABRASIVE INDIANA UNIVERSITY FOUNDATION (US) 1978-08-22 US disclosed