Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4558472 | 0.73 | — | — | |
| SCHEMBL1524477 | 0.73 | HPGD (0.31) | HPGD | |
| SCHEMBL1524402 | 0.73 | HPGD (0.31) | HPGD | |
| SCHEMBL1524401 | 0.73 | HPGD (0.31) | HPGD | |
| SCHEMBL1811894 | 0.71 | — | — | |
| SCHEMBL527584 | 0.70 | — | — | |
| SCHEMBL14811992 | 0.69 | TSHR (0.30) | — | |
| SCHEMBL441396 | 0.67 | — | — | |
| SCHEMBL9288172 | 0.67 | HPGD (0.33) | HPGD | |
| SCHEMBL3891809 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0907109-B1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC (US) | 2005-11-16 | — | — | EP | claimed |
| EP-1035437-B1 | A radiation-sensitive resist material and a process for device fabrication using the same | LUCENT TECHNOLOGIES INC (US) | 2002-03-27 | — | — | EP | claimed |
| US-6296984-B1 | PHOTORESISTS LIGHT SENSITIVE LAYERS ON A SUBSTRATE WITH CHROMOPHORE OF IODINIUM AND SULFONIUM GROUPS | AGERE SYSTEMS GUARDIAN CORP. | 2001-10-02 | — | — | US | claimed |
| EP-1035437-A2 | A radiation-sensitive resist material and a process for device fabrication using the same | LUCENT TECHNOLOGIES INC. (US) | 2000-09-13 | — | — | EP | claimed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | claimed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | claimed |
| CN-117882008-A | Positive photosensitive resin composition | 日保丽公司 | 2024-04-12 | — | — | CN | disclosed |
| WO-2023080254-A1 | POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION | 株式会社レゾナック | 2023-05-11 | — | — | WO | disclosed |
| US-7504198-B2 | Methods for enhancing resolution of a chemically amplified photoresist | ADVANCED MICRO DEVICES, INC. (US) | 2009-03-17 | — | — | US | disclosed |
| US-20070275321-A1 | Methods for enhancing resolution of a chemically amplified photoresist | ADVANCED MICRO DEVICES, INC. | 2007-11-29 | — | — | US | disclosed |
| US-7192684-B2 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| EP-0907109-B1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC (US) | 2005-11-16 | — | — | EP | disclosed |
| US-20040067436-A1 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| EP-1035437-B1 | A radiation-sensitive resist material and a process for device fabrication using the same | LUCENT TECHNOLOGIES INC (US) | 2002-03-27 | — | — | EP | disclosed |
| US-6296984-B1 | PHOTORESISTS LIGHT SENSITIVE LAYERS ON A SUBSTRATE WITH CHROMOPHORE OF IODINIUM AND SULFONIUM GROUPS | AGERE SYSTEMS GUARDIAN CORP. | 2001-10-02 | — | — | US | disclosed |
| EP-1035437-A2 | A radiation-sensitive resist material and a process for device fabrication using the same | LUCENT TECHNOLOGIES INC. (US) | 2000-09-13 | — | — | EP | disclosed |
| US-6048664-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES, INC. (US) | 2000-04-11 | — | — | US | disclosed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | disclosed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | disclosed |
| EP-0271708-A2 | Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1988-06-22 | — | — | EP | disclosed |