⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10821278 | 0.80 | — | — | |
| SCHEMBL658748 | 0.77 | — | — | |
| SCHEMBL5698969 | 0.76 | — | — | |
| SCHEMBL27888590 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL7689363 | 0.74 | — | — | |
| SCHEMBL2422624 | 0.74 | — | — | |
| SCHEMBL2185691 | 0.74 | — | — | |
| Water SCHEMBL2420831 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL10804914 | 0.74 | KDM4E (0.38) | — | |
| SCHEMBL536314 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090127501-A1 | Polishing Composition for Silicon Wafer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-21 | — | — | US | claimed |
| US-20080115423-A1 | Polishing Composition For Silicon Wafer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-05-22 | — | — | US | claimed |
| US-20030153787-A1 | Esters of alkyl or alkenyl succinic acids with polyalkylene oxide derivatives of polyhydroxyl compounds have very useful thickening and or dispersant properties; cosmetics; detergent for shampoos, particularly for baby shampoos; emulsifiers | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 2003-08-14 | — | — | US | claimed |
| US-20020013494-A1 | SURFACTANTS | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 2002-01-31 | — | — | US | claimed |
| EP-0963245-A1 | SURFACTANTS | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1999-12-15 | — | — | EP | claimed |
| WO-1998037957-A1 | SURFACTANTS | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1998-09-03 | — | — | WO | claimed |
| US-20090127501-A1 | Polishing Composition for Silicon Wafer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-21 | — | — | US | disclosed |
| US-20080115423-A1 | Polishing Composition For Silicon Wafer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20050089489-A1 | Composition for exfoliation agent effective in removing resist residues | EKC TECHNOLOGY, INC. | 2005-04-28 | — | — | US | disclosed |
| US-6692886-B2 | ALUMINUM PLATE SUBJECTED TO GRAINING AND ANODIZING TREATMENT IS RINSED WITH WATER, COATED WITH LIQUID CONTAINING PHYSICAL DEVELOPMENT NUCLEI IN A WET STATE AND SUBSEQUENTLY COATED WITH SILVER HALIDE EMULSION LAYER | MITSUBISHI PAPER MILLS LIMITED (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20020177064-A1 | Method for manufacturing a lithographic printing plate | MITSUBISHI PAPER MILLS LIMITED (JP) | 2002-11-28 | — | — | US | disclosed |
| EP-0843841-B1 | STRIPPING COMPOSITION | KONINKL PHILIPS ELECTRONICS NV (NL) | 2002-09-04 | — | — | EP | disclosed |
| US-6174643-B1 | DEVELOPING LITHOGRAPHIC PRINTING PLATE BY SUBJECTING TO DEVELOPMENT SO AS TO CONTROL DECREASED AMOUNT OF ALUMINUM OXIDE BY ADJUSTING DEVELOPMENT CONDITIONS OF SOLUTION | MITSUBISHI PAPER MILLS LIMITED (JP) | 2001-01-16 | — | — | US | disclosed |
| US-6162575-A | Process for making lithographic printing plate | MITSUBISHI PAPER MILLS LIMITED (JP) | 2000-12-19 | — | — | US | disclosed |
| US-6129772-A | A DISTILLATE FUEL COMPRISING OIL ADDITIVE INCLUDING SATURATED OR UNSATURATED FATTY ACIDS OR A SYNTHETIC ACIDS AND SATURATED OR UNSATURATED, OLIGOMERIC FATTY ACIDS TO IMPROVE ENGINES LUBRICATION | BAKER HUGHES INCORPORATED (US) | 2000-10-10 | — | — | US | disclosed |
| EP-0843841-A1 | STRIPPING COMPOSITION | Koninklijke Philips Electronics N.V. (NL) | 1998-05-27 | — | — | EP | disclosed |
| WO-1997048023-A1 | STRIPPING COMPOSITION | PHILIPS ELECTRONICS N.V. (NL) | 1997-12-18 | — | — | WO | disclosed |
| US-4280963-A | Manganese complexes of salicylaldehyde-alkanolimines as catalysts for the polymerization of 2,6-di-substituted phenols | GENERAL ELECTRIC COMPANY (US) | 1981-07-28 | — | — | US | disclosed |
| US-4093597-A | OXIDATIVE COUPLING; AS CATALYST, A MANGANESE CHELATE DERIVED FROM A SALICYLALDEHYDE-ALKANOLIMINE | GENERAL ELECTRIC COMPANY (US) | 1978-06-06 | — | — | US | disclosed |