SCHEMBL3922969

SCHEMBL3922969

[c]1cc[c]c2cc3[c]cc[c]c3cc12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17044573 0.76
SCHEMBL1392524 0.71 CYP3A4 (0.32)
SCHEMBL1173857 0.60
SCHEMBL5027537 0.55
SCHEMBL387162 0.55
SCHEMBL1829489 0.37
SCHEMBL61080 0.35
Methane SCHEMBL23044967 0.30
SCHEMBL28661666 0.30
SCHEMBL29889134 0.30

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7534539-B2 Electrophotographic photoreceptor and image forming apparatus having the same SHARP KABUSHIKI KAISHA (JP) 2009-05-19 US disclosed
US-7268201-B2 Insulating-film forming material and insulating film using the same FUJIFILM CORPORATION (JP) 2007-09-11 US disclosed
US-7144970-B2 Insulating-film forming material and insulating film using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-12-05 US disclosed
US-20060210895-A1 Photosensitive material for electrophotography and image forming device having the same SHARP KABUSHIKI KAISHA (JP) 2006-09-21 US disclosed
US-20040198922-A1 Insulating-film forming material and insulating film using the same FUJI PHOTO FILM CO., LTD. 2004-10-07 US disclosed
US-20040198855-A1 Insulating-film forming material and insulating film using the same FUJI PHOTO FILM CO., LTD. 2004-10-07 US disclosed
US-4013618-A NITROGEN-CONTAINING STABILIZER TOYOBO CO., LTD. (JA) 1977-03-22 US disclosed