⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6813360 | 0.71 | — | — | |
| SCHEMBL5852485 | 0.70 | — | — | |
| SCHEMBL2870650 | 0.70 | — | — | |
| SCHEMBL7607503 | 0.70 | — | — | |
| SCHEMBL2420061 | 0.68 | — | — | |
| SCHEMBL3135174 | 0.68 | — | — | |
| SCHEMBL6905393 | 0.68 | — | — | |
| SCHEMBL8756414 | 0.68 | — | — | |
| SCHEMBL8626058 | 0.68 | — | — | |
| SCHEMBL5086423 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090324827-A1 | CVD FILM FORMING METHOD AND CVD FILM FORMING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2009-12-31 | — | — | US | disclosed |
| US-20090042397-A1 | COPPER RE-DEPOSITION PREVENTING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SUBSTRATE PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2009-02-12 | — | — | US | disclosed |