SCHEMBL393381

SCHEMBL393381

C=C[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C=C)(O[Si](C)(C)C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL247801 0.97
SCHEMBL15216273 0.82
SCHEMBL395582 0.82
SCHEMBL8355634 0.82
SCHEMBL1456715 0.82
SCHEMBL25189398 0.82
SCHEMBL28596480 0.80
SCHEMBL1502326 0.77
SCHEMBL5701357 0.76
SCHEMBL1456083 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO claimed
US-20250157825-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-05-15 US claimed
US-20240258111-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-08-01 US claimed
US-11447642-B2 Methods of using surface treatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-09-20 US claimed
CN-110137426-B Preparation method of pole piece with PTC coating and lithium ion battery 珠海冠宇电池股份有限公司 2022-02-15 CN claimed
US-11174394-B2 Surface treatment compositions and articles containing same FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
EP-3830196-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2021-06-09 EP claimed
US-20210122925-A1 METHODS OF USING SURFACE TREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2021-04-29 US claimed
EP-3735325-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2020-11-11 EP claimed
WO-2020028214-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2020-02-06 WO claimed
US-20200035494-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2020-01-30 US claimed
WO-2019135901-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2019-07-11 WO claimed
US-20190211210-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2019-07-11 US claimed
EP-2470574-B1 PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION BRIDGESTONE CORP (JP) 2014-09-17 EP claimed
EP-2470574-A2 PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION Bridgestone Corporation (JP) 2012-07-04 EP claimed
US-20120165484-A1 PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION BRIDGESTONE CORPORATION (JP) 2012-06-28 US claimed
WO-2011028523-A2 PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION BRIDGESTONE CORPORATION (JP) 2011-03-10 WO claimed
CN-122095045-A Etching composition 2026-05-26 CN disclosed
US-20100041909-A1 METHOD FOR THE PRODUCTION OF POLYMERIZABLE SILICONES WACKER CHEMIE AG (DE) 2010-02-18 US disclosed
US-20100029972-A1 METHOD FOR THE PRODUCTION OF POLYMERIZABLE SILICONES WACKER CHEMIE AG (DE) 2010-02-04 US disclosed