Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.63 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.63 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.63 |
| ▸ | LMNA | P02545 | 1/20 | 0.63 |
| ▸ | MAPT | P10636 | 1/20 | 0.63 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.63 |
| ▸ | ESR1 | P03372 | 1/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | PDK2 | Q15119 | 3/20 | 0.42 |
| ▸ | MDM2 | Q00987 | 4/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30288910 | 1.00 | MEN1 (0.63) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL24155407 | 0.96 | MEN1 (0.59) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL5355967 | 0.94 | MEN1 (0.57) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL30233830 | 0.90 | MEN1 (0.53) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL21878525 | 0.90 | MEN1 (0.53) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL21878524 | 0.90 | MEN1 (0.53) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL17805156 | 0.90 | MEN1 (0.53) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL30233364 | 0.90 | MEN1 (0.53) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL30716814 | 0.86 | MEN1 (0.48) | MEN1KMT2ASMN1; SMN2KDM4ELMNA | |
| SCHEMBL12745295 | 0.86 | MAPT (0.49) | MEN1KMT2ASMN1; SMN2KDM4ELMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023243205-A1 | METHODS FOR PRODUCING AROMATIC THIOETHER SULFONE POLYMER, COMPOSITION, AND MOLDED ARTICLE | DIC株式会社 | 2023-12-21 | — | — | WO | disclosed |
| WO-2023243204-A1 | AROMATIC THIOETHER SULFONE POLYMER, COMPOSITION, AND MOLDED ARTICLE, AND METHODS FOR PRODUCING SAME | DIC株式会社 | 2023-12-21 | — | — | WO | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| US-20060210812-A1 | Insulating film and method of forming the same | JSR CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1696478-A1 | INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-08-30 | — | — | EP | disclosed |
| EP-1679184-A1 | LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-6824833-B2 | STACKED DIELECTRIC | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| EP-1122746-B1 | Composition for film formation and insulating film | JSR CORP (JP) | 2004-09-22 | — | — | EP | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-6468589-B2 | A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING | JSR CORPORATION (JP) | 2002-10-22 | — | — | US | disclosed |
| US-20010012870-A1 | Composition for film formation and insulating film | JSR CORPORATION (JP) | 2001-08-09 | — | — | US | disclosed |
| EP-1122746-A1 | Composition for film formation and insulating film | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |