SCHEMBL395256

SCHEMBL395256

C=CCCCCCCC(=C)CCC=C

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.54
ABCC4 O15439 1/20 0.54
ALDH1A1 P00352 4/20 0.47
LMNA P02545 3/20 0.47
TSHR P16473 2/20 0.44
LPAR3 Q9UBY5 2/20 0.42
TRPA1 O75762 3/20 0.40
LPAR2 Q9HBW0 1/20 0.38
CYP3A4 P08684 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
USP2 O75604 2/20 0.33
RECQL P46063 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HPGD P15428 1/20 0.31
FAAH O00519 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL393878 0.97 MAPT (0.50) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL8609151 0.95 MAPT (0.58) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL9007415 0.95 MAPT (0.58) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL8585201 0.95 MAPT (0.58) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL18585414 0.95 MAPT (0.58) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL9007405 0.95 MAPT (0.58) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL393724 0.95 MAPT (0.58) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL23666251 0.84 TSHR (0.56) MAPTALDH1A1LMNATSHRCYP3A4
SCHEMBL6672214 0.84 TSHR (0.70) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL19235335 0.84 TSHR (0.70) MAPTABCC4ALDH1A1LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150322314-A1 Moisture-Curing Polyurethane Composition Comprising Sustainably Produced Raw Materials HENKEL AG & CO. KGAA (DE) 2015-11-12 US disclosed
US-8101681-B2 Prepolymer mixture containing silyl groups and use thereof HENKEL AG & CO. KGAA (DE) 2012-01-24 US disclosed
US-20090306283-A1 PREPOLYMER MIXTURE CONTAINING SILYL GROUPS AND USE THEREOF HENKEL AG & CO. KGAA (DE) 2009-12-10 US disclosed
CN-100457422-C Method for producing ethylene polymer film and the film SUMITOMO CHEMICAL CO (JP) 2009-02-04 CN disclosed
CN-1644351-A Method for producing ethylene polymer film and the film SUMITOMO CHEMICAL CO (JP) 2005-07-27 CN disclosed