SCHEMBL3958183

SCHEMBL3958183

OS(=S)S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL56798 0.72
Hydrochloric Acid SCHEMBL9839946 0.67
Ammonia Solution, Strong SCHEMBL4303202 0.67
SCHEMBL15159913 0.62
SCHEMBL56797 0.62
SCHEMBL14879290 0.62
SCHEMBL18652429 0.62
Ammonia Solution, Strong SCHEMBL4368300 0.62
SCHEMBL16803002 0.62
Sulfurous Acid SCHEMBL7263130 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7547388-B2 Superoxidant poiser for groundwater and soil treatment with in-situ oxidation-reduction and acidity-basicity adjustment THINK VILLAGE-KERFOOT, LLC (US) 2009-06-16 US claimed
EP-1773723-A2 SUPEROXIDANT POISER FOR GROUNDWATER AND SOIL TREATMENT WITH IN-SITU OXIDATION-REDUCTION AND ACIDITY-BASICITY ADJUSTMENT Kerfoot, William (US) 2007-04-18 EP claimed
WO-2006020262-A2 SUPEROXIDANT POISER FOR GROUNDWATER AND SOIL TREATMENT WITH IN-SITU OXIDATION-REDUCTION AND ACIDITY-BASICITY ADJUSTMENT KERFOOT WILLIAM B (US) 2006-02-23 WO claimed
US-20060016763-A1 Superoxidant poiser for groundwater and soil treatment with in-situ oxidation-reduction and acidity-basicity adjustment KERFOOT TECHNOLOGIES, INC. 2006-01-26 US claimed
JP-62270779-A None JP disclosed
CN-117615758-A Pharmaceutical composition for increasing mitochondrial activity and/or increasing adiponectin production 罗吉科能量有限公司 2024-02-27 CN disclosed
EP-1338416-B1 Method for making lithographic printing plate FUJIFILM CORP (JP) 2007-09-05 EP disclosed
US-20030232281-A1 Method for making lithographic printing plate FUJI PHOTO FILM CO., LTD. 2003-12-18 US disclosed
EP-1338416-A2 Method for making lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-08-27 EP disclosed
JP-S62270779-A ELECTROLESS GOLD PLATING SOLUTION HITACHI LTD 1987-11-25 JP disclosed
US-4205161-A Process for reducing content of free vinyl chloride by posttreating copolymer with redox catalyst WACKER-CHEMIE GMBH (DE) 1980-05-27 US disclosed