⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6283637 | 0.71 | — | — | |
| SCHEMBL8845758 | 0.59 | — | — | |
| SCHEMBL649540 | 0.58 | — | — | |
| SCHEMBL3426362 | 0.53 | — | — | |
| SCHEMBL8358538 | 0.53 | TSHR (0.43) | — | |
| SCHEMBL2151842 | 0.53 | TSHR (0.43) | — | |
| SCHEMBL1913 | 0.53 | — | — | |
| SCHEMBL7925914 | 0.50 | — | — | |
| SCHEMBL11632388 | 0.47 | — | — | |
| Water SCHEMBL11756523 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250259884-A1 | HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE COMPRISING AN ISOLATION REGION | GLOBALWAFERS CO., LTD. (TW) | 2025-08-14 | — | — | US | disclosed |
| US-12300535-B2 | High resistivity silicon-on-insulator substrate comprising an isolation region | GLOBALWAFERS CO., LTD. (TW) | 2025-05-13 | — | — | US | disclosed |
| US-20230163022-A1 | HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE COMPRISING AN ISOLATION REGION | GLOBALWAFERS CO., LTD. (TW) | 2023-05-25 | — | — | US | disclosed |
| US-11587825-B2 | Method of preparing an isolation region in a high resistivity silicon-on-insulator substrate | GLOBALWAFERS CO., LTD. (TW) | 2023-02-21 | — | — | US | disclosed |
| US-11380576-B2 | Method of preparing an isolation region in a high resistivity silicon-on-insulator substrate | GLOBALWAFERS CO., LTD. (TW) | 2022-07-05 | — | — | US | disclosed |
| US-20210035855-A1 | METHOD OF PREPARING AN ISOLATION REGION IN A HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE | SUNEDISON SEMICONDUCTOR LIMITED (UEN201334164H) (SG) | 2021-02-04 | — | — | US | disclosed |
| US-20210013091-A1 | METHOD OF PREPARING AN ISOLATION REGION IN A HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE | SUNEDISON SEMICONDUCTOR LIMITED (UEN201334164H) (SG) | 2021-01-14 | — | — | US | disclosed |
| US-10825718-B2 | Method of preparing an isolation region in a high resistivity silicon-on-insulator substrate | GLOBALWAFERS CO., LTD. (TW) | 2020-11-03 | — | — | US | disclosed |
| US-10475695-B2 | High resistivity silicon-on-insulator substrate comprising an isolation region | GLOBALWAFERS CO., LTD. (TW) | 2019-11-12 | — | — | US | disclosed |
| US-20190214294-A1 | METHOD OF PREPARING AN ISOLATION REGION IN A HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE | GLOBALWAFERS CO., LTD. (TW) | 2019-07-11 | — | — | US | disclosed |
| EP-0560029-B1 | Process for making alkyl arsine compounds | CYTEC TECH CORP (US) | 1998-07-01 | — | — | EP | disclosed |
| US-5415129-A | Bronsted acid catalyst | CYTEC TECHNOLOGY CORP. (US) | 1995-05-16 | — | — | US | disclosed |
| EP-0324958-B1 | Process for making alkyl arsine compounds | AMERICAN CYANAMID CO (US) | 1994-09-21 | — | — | EP | disclosed |
| US-5274149-A | Continuous process by contacting an olefin, arsine and a Bronsted acid catalyst; vapor phase | AMERICAN CYANAMID COMPANY (US) | 1993-12-28 | — | — | US | disclosed |
| EP-0560029-A1 | Process for making alkyl arsine compounds | CYTEC TECHNOLOGY CORP. (US) | 1993-09-15 | — | — | EP | disclosed |
| US-5003092-A | Use of R2 MR' to prepare semiconductor and ceramic precursors | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NY (US) | 1991-03-26 | — | — | US | disclosed |
| US-5003093-A | Process for making alkyl arsine compounds | AMERICAN CYANAMID | 1991-03-26 | — | — | US | disclosed |
| US-4857655-A | Process for making alkyl arsine compounds | AMERICAN CYANAMID COMPANY (US) | 1989-08-15 | — | — | US | disclosed |
| EP-0324958-A2 | Process for making alkyl arsine compounds | CYTEC TECHNOLOGY CORP. (US) | 1989-07-26 | — | — | EP | disclosed |
| US-4721683-A | LIQUID PHASE | AMERICAN CYANAMID COMPANY (US) | 1988-01-26 | — | — | US | disclosed |