⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL4810308 | 0.97 | — | — | |
| SCHEMBL820859 | 0.75 | — | — | |
| SCHEMBL31163706 | 0.73 | — | — | |
| SCHEMBL31163705 | 0.73 | — | — | |
| SCHEMBL31163709 | 0.73 | — | — | |
| SCHEMBL14543921 | 0.73 | — | — | |
| SCHEMBL4469566 | 0.73 | — | — | |
| SCHEMBL3843958 | 0.71 | — | — | |
| SCHEMBL14544071 | 0.69 | — | — | |
| SCHEMBL708310 | 0.66 | MEN1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1730593-B1 | A PROCESS OF IMAGING A DEEP ULTRAVIOLET PHOTORESIST WITH A TOP COATING | MERCK PATENT GMBH (DE) | 2019-04-24 | — | — | EP | disclosed |
| US-7473512-B2 | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-01-06 | — | — | US | disclosed |
| US-7425646-B2 | Fluorinated adamantane derivative | ASAHI GLASS COMPANY, LIMITED (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20070083064-A1 | NOVEL FLUORINATED ADAMANTANE DERIVATIVE | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1730593-A2 | A PROCESS OF IMAGING A DEEP ULTRAVIOLET PHOTORESIST WITH A TOP COATING AND MATERIALS THEREOF | AZ Electronic Materials USA Corp. (US) | 2006-12-13 | — | — | EP | disclosed |
| WO-2005088397-A2 | A PROCESS OF IMAGING A DEEP ULTRAVIOLET PHOTORESIST WITH A TOP COATING AND MATERIALS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-09-22 | — | — | WO | disclosed |
| US-20050202340-A1 | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof | MERCK PATENT GMBH (DE) | 2005-09-15 | — | — | US | disclosed |
| US-20050202347-A1 | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2005-09-15 | — | — | US | disclosed |