Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 1/20 | 0.54 |
| ▸ | LCK | P06239 | 1/20 | 0.54 |
| ▸ | FYN | P06241 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 3/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | BLM | P54132 | 1/20 | 0.50 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.50 |
| ▸ | ACHE | P22303 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | LDHA | P00338 | 1/20 | 0.38 |
| ▸ | LDHB | P07195 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.36 |
| ▸ | CRBN | Q96SW2 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | FGFR4 | P22455 | 1/20 | 0.33 |
| ▸ | THPO | P40225 | 1/20 | 0.33 |
| ▸ | TAS2R38 | P59533 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL20769539 | 1.00 | — | — | |
| Acetic Acid SCHEMBL29157568 | 0.96 | FFAR3 (0.50) | FFAR3LCKFYNLMNAALOX15 | |
| Acetic Acid SCHEMBL29289472 | 0.96 | FFAR3 (0.50) | FFAR3LCKFYNLMNAALOX15 | |
| Acetic Acid SCHEMBL28567504 | 0.96 | FFAR3 (0.50) | FFAR3LCKFYNLMNAALOX15 | |
| Acetic Acid SCHEMBL7215627 | 0.81 | — | — | |
| Acetic Acid SCHEMBL2312490 | 0.81 | FFAR3 (0.50) | FFAR3LCKFYNLMNAALOX15 | |
| Acetic Acid SCHEMBL9302254 | 0.81 | FFAR3 (0.50) | FFAR3LCKFYNLMNAALOX15 | |
| Acetic Acid SCHEMBL5160416 | 0.81 | FFAR3 (0.50) | FFAR3LCKFYNLMNAALOX15 | |
| Acetic Acid SCHEMBL6707540 | 0.81 | FFAR3 (0.50) | FFAR3LCKFYNLMNAALOX15 | |
| Acetic Acid SCHEMBL5547843 | 0.81 | FFAR3 (0.50) | FFAR3LCKFYNLMNAALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313722-A1 | CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | SOULBRAIN CO., LTD. (KR) | 2025-10-09 | — | — | US | claimed |
| CN-120089770-A | Negative electrode electrolyte and acidic tin-bromine flow battery | 中国科学院大连化学物理研究所 | 2025-06-03 | — | — | CN | claimed |
| CN-119852461-A | Neutral zinc ion negative electrode electrolyte, zinc-based flow battery and application | 北京恒储瑞能科技有限公司 | 2025-04-18 | — | — | CN | claimed |
| CN-117511412-A | Chemical mechanical polishing solution and polishing method thereof | 深圳清华大学研究院 | 2024-02-06 | — | — | CN | claimed |
| US-20250313722-A1 | CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | SOULBRAIN CO., LTD. (KR) | 2025-10-09 | — | — | US | disclosed |
| CN-120089770-A | Negative electrode electrolyte and acidic tin-bromine flow battery | 中国科学院大连化学物理研究所 | 2025-06-03 | — | — | CN | disclosed |
| CN-119852461-A | Neutral zinc ion negative electrode electrolyte, zinc-based flow battery and application | 北京恒储瑞能科技有限公司 | 2025-04-18 | — | — | CN | disclosed |
| CN-118922473-A | Block copolymer, process for producing the same and composition thereof | 巴斯夫欧洲公司 | 2024-11-08 | — | — | CN | disclosed |
| CN-118435218-A | Environmental attributes of the care composition ingredients | 巴斯夫欧洲公司 | 2024-08-02 | — | — | CN | disclosed |
| CN-118434782-A | Water-soluble graft polymers, their preparation, use and compositions comprising such polymers | 巴斯夫欧洲公司 | 2024-08-02 | — | — | CN | disclosed |
| CN-118414369-A | Polypropylene imine polymer (PPI), preparation, use and composition comprising such PPI | 巴斯夫欧洲公司 | 2024-07-30 | — | — | CN | disclosed |
| CN-118318027-A | Amphoteric modified trialkyl tetramine ethoxylates for improved laundry detergent stain removal | 巴斯夫欧洲公司 | 2024-07-09 | — | — | CN | disclosed |
| CN-116426346-A | Starch dirt cleaning agent on fin and preparation method and application thereof | 浙江康星科技有限公司 | 2023-07-14 | — | — | CN | disclosed |
| WO-2016126550-A1 | EXPANDED, MERCURY-SORBENT MATERIALS | NOVINDA CORPORATION (US) | 2016-08-11 | — | — | WO | disclosed |
| US-8987720-B2 | Transparent surface electrode, organic electronic element, and method for manufacturing transparent surface electrode | Konica Minolta, Inc. (JP) | 2015-03-24 | — | — | US | disclosed |
| US-20130285041-A1 | TRANSPARENT SURFACE ELECTRODE, ORGANIC ELECTRONIC ELEMENT, AND METHOD FOR MANUFACTURING TRANSPARENT SURFACE ELECTRODE | Konica Minolta, Inc. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-7479524-B2 | Process for producing aqueous resin dispersions | KANSAI PAINT CO., LTD. (JP) | 2009-01-20 | — | — | US | disclosed |
| US-20060167178-A1 | Process for producing aqueous resin dispersion | KANSAI PAINT CO., LTD. (JP) | 2006-07-27 | — | — | US | disclosed |
| EP-1598373-A1 | PROCESS FOR PRODUCING AQUEOUS RESIN DISPERSION | KANSAI PAINT CO., LTD. (JP) | 2005-11-23 | — | — | EP | disclosed |
| US-6190825-B1 | N-(P-AMINOSULFONYL)PHENYL-SUBSTITUTED | AGFA-GEVAERT N.V. (BE) | 2001-02-20 | — | — | US | disclosed |