Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL3975598

CCCCC(CC)CC(C(=O)O)C(CC(CC)CCCC)(C(=O)O)S(=O)(=O)O.N.N

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RECQL P46063 2/20 0.36
CA2 P00918 3/20 0.35
MAPK1 P28482 1/20 0.35
ALDH1A1 P00352 2/20 0.33
HSPD1 P10809 1/20 0.33
BLM P54132 1/20 0.33
HSPE1 P61604 1/20 0.33
TSHR P16473 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
CYP3A4 P08684 1/20 0.33
ATM Q13315 1/20 0.33
SLC1A3 P43003 1/20 0.31
SLC1A2 P43004 1/20 0.31
SLC1A1 P43005 1/20 0.31
MEN1 O00255 1/20 0.31
HPGD P15428 1/20 0.31
KMT2A Q03164 1/20 0.31
HSD17B10 Q99714 1/20 0.31
HDAC3 O15379 1/20 0.30
HDAC4 P56524 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL466472 1.00 RECQL (0.36) RECQLCA2MAPK1ALDH1A1HSPD1
Ammonia Solution, Strong SCHEMBL466470 1.00 RECQL (0.36) RECQLCA2MAPK1ALDH1A1HSPD1
SCHEMBL186952 0.99 RECQL (0.36) RECQLCA2MAPK1ALDH1A1HSPD1
SCHEMBL2425805 0.97 RECQL (0.36) RECQLCA2MAPK1ALDH1A1HSPD1
SCHEMBL20526055 0.97 RECQL (0.36) RECQLCA2MAPK1ALDH1A1HSPD1
SCHEMBL51226 0.97 RECQL (0.36) RECQLCA2MAPK1ALDH1A1HSPD1
SCHEMBL3797837 0.97 RECQL (0.36) RECQLCA2MAPK1ALDH1A1HSPD1
SCHEMBL466503 0.97 RECQL (0.36) RECQLCA2MAPK1ALDH1A1HSPD1
SCHEMBL18244065 0.95 RECQL (0.34) RECQLCA2MAPK1ALDH1A1HSPD1
Boric Acid SCHEMBL5490022 0.95 RECQL (0.34) RECQLCA2MAPK1ALDH1A1HSPD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3263612-B1 POLYMER POWDER, CURABLE RESIN COMPOSITION AND CURED MATERIAL THEREOF MITSUBISHI CHEM CORP (JP) 2020-08-05 EP disclosed
EP-2664651-B1 CROSSLINKED POLYMER PARTICLES FOR EPOXY RESINS, EPOXY RESIN COMPOSITION, AND CURED EPOXY ARTICLE MITSUBISHI CHEM CORP (JP) 2019-03-27 EP disclosed
EP-3263612-A1 POLYMER POWDER, CURABLE RESIN COMPOSITION AND CURED MATERIAL THEREOF Mitsubishi Chemical Corporation (JP) 2018-01-03 EP disclosed
EP-2796482-B1 POLYMER POWDER, CURABLE RESIN COMPOSITION, AND CURED PRODUCT THEREOF MITSUBISHI CHEM CORP (JP) 2017-09-13 EP disclosed
US-9522997-B2 Polymer powder, curable resin composition and cured material thereof MITSUBISHI RAYON CO., LTD. (JP) 2016-12-20 US disclosed
US-20160096955-A1 Polymer Powder, Curable Resin Composition and Cured Material Thereof MITSUBISHI RAYON CO., LTD. (JP) 2016-04-07 US disclosed
US-9193812-B2 Polymer powder, curable resin composition and cured material thereof MITSUBISHI RAYON CO., LTD. (JP) 2015-11-24 US disclosed
US-20140350186-A1 Polymer Powder, Curable Resin Composition and Cured Material Thereof MITSUBISHI RAYON CO., LTD. (JP) 2014-11-27 US disclosed
EP-2796482-A1 POLYMER POWDER, CURABLE RESIN COMPOSITION, AND CURED PRODUCT THEREOF Mitsubishi Rayon Co., Ltd. (JP) 2014-10-29 EP disclosed
US-20140296437-A1 Vinyl Polymer Powder, Curable Resin Composition and Cured Product MITSUBISHI RAYON CO., LTD. (JP) 2014-10-02 US disclosed
US-6780819-B2 A SUPPORT HAVING HEAT SENSITIVE RECORDING LAYER AND A PROTECTIVE LAYER CONTAINING AN AMMONIUM SALT OF A DIALKYL SULFOSUCCINATE; LIGHT RESISTANCE IN A BACKGROUND AND IMAGE; STORAGE STABILITY; HEAT RESISTANCE; SOLVENT RESISTANCE FUJI PHOTO FILM CO., LTD. (JP) 2004-08-24 US disclosed
EP-1348569-A2 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2003-10-01 EP disclosed
EP-1331104-A2 Heat sensitive recording material and recording method FUJI PHOTO FILM CO., LTD. (JP) 2003-07-30 EP disclosed
US-20030092572-A1 Heat sensitive recording material FUJI PHOTO FILM CO., LTD. 2003-05-15 US disclosed
EP-1297966-A2 Heat sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2003-04-02 EP disclosed
EP-1297967-A2 Thermal recording material and production method thereof FUJI PHOTO FILM CO., LTD. (JP) 2003-04-02 EP disclosed
EP-1215644-A2 Adhesive recording paper FUJI PHOTO FILM CO., LTD. (JP) 2002-06-19 EP disclosed
US-6261352-B1 BETAINE, SULFO ESTER THE PILOT INK CO., LTD. (JP) 2001-07-17 US disclosed
EP-0964036-A2 Water-based ball-point pen ink composition THE PILOT INK CO., LTD. (JP) 1999-12-15 EP disclosed
US-4962009-A DRY IMAGE FORMING FUJI PHOTO FILM CO., LTD. (JP) 1990-10-09 US disclosed