Resorcinol

Resorcinol

SCHEMBL3984288

Oc1cccc(O)c1.[NaH].[NaH]

nearest known ligand 0.92

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 4/20 0.92
CA2 P00918 4/20 0.92
CA9 Q16790 4/20 0.92
ALDH1A1 P00352 3/20 0.92
CA14 Q9ULX7 3/20 0.92
CYP3A4 P08684 3/20 0.92
LMNA P02545 1/20 0.92
CA5A P35218 1/20 0.92
HSD17B10 Q99714 1/20 0.92
CA5B Q9Y2D0 1/20 0.92
HSD17B1 P14061 4/20 0.58
HSD17B2 P37059 4/20 0.58
CA1 P00915 3/20 0.58
TSHR P16473 3/20 0.58
TDP1 Q9NUW8 2/20 0.58
ACHE P22303 2/20 0.58
CYP2C9 P11712 1/20 0.58
CA7 P43166 1/20 0.58
LCK P06239 1/20 0.55
ENPP2 Q13822 2/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Resorcinol SCHEMBL8442393 1.00
Resorcinol SCHEMBL15515 0.96
Resorcinol SCHEMBL326229 0.96 CA12 (1.00) CA12CA2CA9ALDH1A1CA14
Resorcinol SCHEMBL5867187 0.92
Resorcinol SCHEMBL563023 0.92 CA12 (0.92) CA12CA2CA9ALDH1A1CA14
Resorcinol SCHEMBL20577903 0.92
Resorcinol SCHEMBL11679916 0.92 CA12 (0.92) CA12CA2CA9ALDH1A1CA14
Resorcinol SCHEMBL8829963 0.92
Resorcinol SCHEMBL971994 0.92
Resorcinol SCHEMBL6842721 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109912391-B Refining and coproduction method of resorcinol and 2-mercaptobenzothiazole 华奇(中国)化工有限公司 2021-09-07 CN claimed
CN-102807489-B The manufacture method of 2,5-Dihydroxyterephthalic acid Ueno Seiyaku K. K. (JP) 2015-11-18 CN claimed
CN-102807489-A Process for preparing 2,5-dihydroxyterephthalic acid UENO FINE CHEMICAL IND 2012-12-05 CN claimed
CN-118344328-A Non-amine method preparation technology of vinylene carbonate 深圳有为技术控股集团有限公司 2024-07-16 CN disclosed
CN-113788801-B Compound containing halogenated thiazole structure, preparation method and application thereof 中国农业大学 2023-05-05 CN disclosed
CN-113788801-A Compound containing halogenated thiazole structure, preparation method and application thereof 中国农业大学 2021-12-14 CN disclosed
CN-109912391-B Refining and coproduction method of resorcinol and 2-mercaptobenzothiazole 华奇(中国)化工有限公司 2021-09-07 CN disclosed
CN-109912391-B Refining and coproduction method of resorcinol and 2-mercaptobenzothiazole 华奇(中国)化工有限公司 2021-09-07 CN disclosed
CN-102807489-B The manufacture method of 2,5-Dihydroxyterephthalic acid Ueno Seiyaku K. K. (JP) 2015-11-18 CN disclosed
CN-103497334-A Copolyetherimides SABIC INNOVATIVE PLASTICS IP 2014-01-08 CN disclosed
CN-101180341-B Preparation method and application of phenylene dioxy diacetic acid INDSPEC CHEMICAL CORP 2013-07-03 CN disclosed
CN-1221733-A Synthesis of 1,3'-di(amino-phenoxy) benzene SHANGHAI INST ORGANIC CHEM (CN) 1999-07-07 CN disclosed
US-5407981-A Reacting ester of dibasic acid, short chain diol,long chain polyglycol, alkali salt of dialkylsulfoisophthalate, stabilizers and alkali salt of phenol; for extrusion, blow molding CHEIL SYNTHETICS INC. (KR) 1995-04-18 US disclosed
EP-0605260-A1 Preparation of polyether ester elastomers having high melt viscosities and crystallization CHEIL SYNTHETICS INC. (KR) 1994-07-06 EP disclosed
EP-0577508-A1 Modification of polyetherester elastomers CHEIL SYNTHETICS INC. (KR) 1994-01-05 EP disclosed
EP-0337322-B1 PROCESS FOR PRODUCING MONOSILANE MITSUBISHI KASEI CORPORATION (JP) 1993-07-21 EP disclosed
EP-0522923-A2 Polyetherester elastomers and a method for their preparation CHEIL SYNTHETICS INC. (KR) 1993-01-13 EP disclosed
US-4904460-A Process for producing monosilane MITSUBISHI KASEI CORPORATION (JP) 1990-02-27 US disclosed
EP-0337322-A2 Process for producing monosilane MITSUBISHI KASEI CORPORATION (JP) 1989-10-18 EP disclosed
US-4160113-A CATALYTIC DEHYDROGENATION OF A CYCLOHEXANE-1,3-DIONE USING NOBLE METAL HOECHST AKTIENGESELLSCHAFT (DE) 1979-07-03 US disclosed