⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28399324 | 0.79 | — | — | |
| SCHEMBL27626219 | 0.76 | — | — | |
| SCHEMBL3985911 | 0.74 | — | — | |
| SCHEMBL5029933 | 0.70 | — | — | |
| SCHEMBL39994 | 0.70 | — | — | |
| SCHEMBL4634539 | 0.70 | — | — | |
| SCHEMBL28095 | 0.67 | — | — | |
| Iodide SCHEMBL19458794 | 0.67 | — | — | |
| SCHEMBL21980762 | 0.67 | — | — | |
| SCHEMBL28993315 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118632884-A | Based on non-brittle coating to improve glass strength and fracture toughness | 艾瑟巨公司 | 2024-09-10 | — | — | CN | claimed |
| CN-118632884-A | Based on non-brittle coating to improve glass strength and fracture toughness | 艾瑟巨公司 | 2024-09-10 | — | — | CN | disclosed |
| CN-116885279-A | Lithium ion battery electrolyte additive, electrolyte and application | 衢州科峰新材料有限公司 | 2023-10-13 | — | — | CN | disclosed |
| CN-115715276-A | Glass strength and fracture toughness improvement based on non-brittle wear-resistant coatings | 艾瑟巨公司 | 2023-02-24 | — | — | CN | disclosed |
| CN-112724925-B | Two-component organic silicon packaging adhesive and preparation method and application thereof | 广州市白云化工实业有限公司 | 2022-08-02 | — | — | CN | disclosed |
| CN-112724925-A | Two-component organic silicon packaging adhesive and preparation method and application thereof | 广州市白云化工实业有限公司 | 2021-04-30 | — | — | CN | disclosed |
| CN-101322074-B | Silicon-containing resist underlying layer film forming composition for formation of photocrosslinking cured resist underlying layer film | NISSAN CHEMICAL IND LTD | 2013-01-23 | — | — | CN | disclosed |
| US-20120276483-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | disclosed |
| US-20090326151-A1 | HAIR COSMETIC | KONISHI CO., LTD. (JP) | 2009-12-31 | — | — | US | disclosed |
| EP-2039347-A1 | COSMETIC HAIR PREPARATION | Shiseido Company, Limited (JP) | 2009-03-25 | — | — | EP | disclosed |
| CN-101322074-A | Silicon-containing resist underlying layer film forming composition for formation of photocrosslinking cured resist underlying layer film | NISSAN CHEMICAL IND LTD (JP) | 2008-12-10 | — | — | CN | disclosed |