⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15403701 | 0.75 | — | — | |
| SCHEMBL269793 | 0.75 | — | — | |
| SCHEMBL21812 | 0.72 | — | — | |
| SCHEMBL1035171 | 0.71 | — | — | |
| SCHEMBL1708138 | 0.69 | — | — | |
| SCHEMBL810731 | 0.69 | — | — | |
| SCHEMBL15402773 | 0.69 | — | — | |
| SCHEMBL15404266 | 0.69 | — | — | |
| SCHEMBL5586308 | 0.68 | — | — | |
| SCHEMBL6745334 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2684870-A1 | METHOD FOR PREPARING THIOCARBOXYLIC ACID S-(FLUOROALKYL) ESTER | Sumitomo Chemical Company Limited (JP) | 2014-01-15 | — | — | EP | disclosed |
| EP-0978016-B1 | ANTIREFLECTIVE COATING COMPOSITIONS FOR PHOTORESIST COMPOSITIONS AND USE THEREOF | AZ ELECTRONIC MATERIALS USA (US) | 2009-06-17 | — | — | EP | disclosed |
| EP-0978015-B1 | LIGHT ABSORBING POLYMERS | AZ ELECTRONIC MATERIALS USA (US) | 2007-06-13 | — | — | EP | disclosed |
| US-7189491-B2 | Photoresist composition for deep UV and process thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-03-13 | — | — | US | disclosed |
| US-20050130058-A1 | Photoresist composition for deep UV and process thereof | MERCK PATENT GMBH (DE) | 2005-06-16 | — | — | US | disclosed |
| US-6897255-B1 | Latex compositions containing ethylenically unsaturated esters of long-chain alkenols and applications thereof | UNIVERSITY OF SOUTHERN MISSISSIPPI (US) | 2005-05-24 | — | — | US | disclosed |
| EP-0965067-B1 | POSITIVE PHOTORESISTS CONTAINING NOVEL PHOTOACTIVE COMPOUNDS | CLARIANT FINANCE BVI LTD (VG) | 2004-09-29 | — | — | EP | disclosed |
| US-6700006-B2 | (METH)ACRYLATE ESTERS OF HYDROXY LONG-CHAIN OLEFINIC COMPOUNDS DERIVED FROM CASTOR OIL, FOR EXAMPLE; LATEX; WATERBORNE COATINGS, ADHESIVES, INKS; FORM WITHOUT USING VOLATILE ORGANIC COMPOUNDS (VOC'S) | UNIVERSITY OF SOUTHERN MISSISSIPPI | 2004-03-02 | — | — | US | disclosed |
| US-6653381-B2 | Copolymers of acrylate or methacrylate esters of hydroxy long-chain olefinic compounds derived from nondrying oils, e.g. castor oil or lesquerella oil preferred; latex films; waterbased paints, coatings, contact and pressure adhesives | UNIVERSITY OF SOUTHERN MISSISSIPPI | 2003-11-25 | — | — | US | disclosed |
| US-6624223-B1 | Crosslinkable copolymer comprising (meth)acrylated castor or lesquerella oil and ethylenically unsaturated monomers; cobalt, manganese, lead, zirconium, or calcium carboxylate drying agent; pressure sensitive adhesives, inks | UNIVERSITY OF SOUTHERN MISSISSIPPI | 2003-09-23 | — | — | US | disclosed |
| US-5876897-A | DIAZAQUINONE DERIVATIVES OF CHROMONE, THIOCHROMONE, OR QUINOLINONE | CLARIANT FINANCE (BVI) LIMITED (VG) | 1999-03-02 | — | — | US | disclosed |
| US-5866295-A | Photosensitive quinolone compounds and a process of preparation | CLARIANT FINANCE (BVI) LIMITED (VG) | 1999-02-02 | — | — | US | disclosed |
| WO-1998039320-A1 | PHOTOACTIVE COUMARIN SULFONATE COMPOUNDS | CLARIANT INTERNATIONAL LTD. (CH) | 1998-09-11 | — | — | WO | disclosed |
| WO-1998039317-A1 | PROCESS FOR PREPARING PHOTOACTIVE COUMARIN DERIVATIVES | CLARIANT INTERNATIONAL LTD. (CH) | 1998-09-11 | — | — | WO | disclosed |
| WO-1998039318-A1 | PROCESS FOR PREPARING COUMARIN SULFONATES | CLARIANT INTERNATIONAL LTD. (CH) | 1998-09-11 | — | — | WO | disclosed |
| WO-1998039319-A1 | PHOTOACTIVE COUMARIN DERIVATIVES | CLARIANT INTERNATIONAL LTD. (CH) | 1998-09-11 | — | — | WO | disclosed |
| US-5773591-A | PHOTORESISTS, LIGHT SENSITIVE ELEMENTS AND DIAZO RESINS | HOECHST CELANESE CORP. (US) | 1998-06-30 | — | — | US | disclosed |
| US-5739295-A | SULFONYL HALIDE OR SULFONIC ACID ESTERS OF 3-DIAZO-2,4-DIOXO-BENZOHETERCYCLIC COMPOUNDS USEFUL SYNTHETIC INTERMEDIATES FOR PHOTORESISTS, OPTOELECTRONICS, AGRICULTURE AND DRUGS | HOECHST CELANESE CORPORATION (US) | 1998-04-14 | — | — | US | disclosed |
| US-5726296-A | PHOTORESISTS | HOECHST CELANESE CORP. (US) | 1998-03-10 | — | — | US | disclosed |
| US-5726295-A | Photoactive coumarin derivatives | HOECHST CELANESE CORP. (US) | 1998-03-10 | — | — | US | disclosed |