SCHEMBL4019719

SCHEMBL4019719

CCC(c1c(O)ccc2ccccc12)c1c(O)ccc2ccccc12

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.54
KMT2A Q03164 3/20 0.54
KDM4E B2RXH2 9/20 0.51
ALDH1A1 P00352 6/20 0.51
GAA P10253 8/20 0.51
NPSR1 Q6W5P4 2/20 0.51
MAPT P10636 3/20 0.50
TDP1 Q9NUW8 2/20 0.50
HSD17B10 Q99714 2/20 0.48
CYP1A2 P05177 1/20 0.48
CYP2C9 P11712 1/20 0.48
CYP2C19 P33261 1/20 0.48
PTPN22 Q9Y2R2 1/20 0.48
GLA P06280 3/20 0.46
HPGD P15428 1/20 0.46
HTT P42858 1/20 0.46
TAAR1 Q96RJ0 1/20 0.46
POLB P06746 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13478402 0.91 KDM4E (0.58) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL13060238 0.91 KDM4E (0.58) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL9423739 0.91 MEN1 (0.47) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL9423428 0.86 MEN1 (0.55) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL21686486 0.84 KMT2A (0.50) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL22202388 0.84 MEN1 (0.49) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL11222127 0.84 KMT2A (0.50) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL8402796 0.82 KMT2A (0.51) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL5596941 0.81 HSD17B10 (0.48) MEN1KMT2AKDM4EALDH1A1GAA
SCHEMBL9423775 0.80 KDM4E (0.45) MEN1KMT2AKDM4EGAANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5302672-A Heat resistance DAINIPPON INK AND CHEMICALS, INC. (JP) 1994-04-12 US claimed
US-20250320180-A1 HYDROXYL GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAYERED PRODUCT DIC CORPORATION (JP) 2025-10-16 US disclosed
US-20250277081-A1 GLYCIDYL ETHER GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED OBJECT, AND LAMINATE DIC CORPORATION (JP) 2025-09-04 US disclosed
US-20250277080-A1 PHENOLIC HYDROXY GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAMINATE DIC CORPORATION (JP) 2025-09-04 US disclosed
US-20250223396-A1 GLYCIDYL ETHER GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAMINATE DIC CORPORATION (JP) 2025-07-10 US disclosed
WO-2025105121-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND DISASSEMBLABLE ADHESIVE MATERIAL DIC株式会社 2025-05-22 WO disclosed
WO-2025105119-A1 EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, AND DISASSEMBLING METHOD DIC株式会社 2025-05-22 WO disclosed
WO-2025105118-A1 EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, AND DISASSEMBLING METHOD DIC株式会社 2025-05-22 WO disclosed
EP-4261037-B1 EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, AND LAMINATE DAINIPPON INK & CHEMICALS (JP) 2025-04-16 EP disclosed
EP-4527834-A1 GLYCIDYL ETHER GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED OBJECT, AND LAMINATE DIC Corporation (JP) 2025-03-26 EP disclosed
US-20060235183-A1 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-10-19 US disclosed
US-7087702-B2 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-08-08 US disclosed
EP-1411101-B1 Epoxy resin composition and process for producing epoxy resins DAINIPPON INK & CHEMICALS (JP) 2006-04-19 EP disclosed
US-20040087740-A1 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2004-05-06 US disclosed
EP-1411101-A1 Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2004-04-21 EP disclosed
EP-0443344-B1 Epoxy resin systems containing methyl-2,6-cyclohexanediamine AIR PROD & CHEM (US) 1994-12-07 EP disclosed
US-5302672-A Heat resistance DAINIPPON INK AND CHEMICALS, INC. (JP) 1994-04-12 US disclosed
US-5066764-A Curing agent for polyepoxide resins AIR PRODUCTS AND CHEMICALS, INC. (US) 1991-11-19 US disclosed
EP-0443344-A2 Epoxy resin systems containing methyl-2,6-cyclohexanediamine AIR PRODUCTS AND CHEMICALS, INC. (US) 1991-08-28 EP disclosed
US-5025078-A Curing agent; heat resistance, elongation and toughness AIR PRODUCTS AND CHEMICALS, INC. (US) 1991-06-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250320180-A1 HYDROXYL GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND LAYERED PRODUCT RAD51, SEM1, GFER MEN1 3384/4885KMT2A 1565/4885KDM4E 756/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.