SCHEMBL402381

SCHEMBL402381

COCCOCCC[Si](C)(O[Si](C)(C)C)O[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10301174 1.00
SCHEMBL10301170 1.00
SCHEMBL18233782 1.00
SCHEMBL10301167 1.00
SCHEMBL10001047 0.93
SCHEMBL13621783 0.93
SCHEMBL10005279 0.93
SCHEMBL577857 0.93
SCHEMBL10301172 0.93
SCHEMBL10301165 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250354017-A1 ANTI-FOGGING AND BACTERIA-RESISTANT LIQUID SILICONE RUBBER ADDITIVES AND THE APPLICATIONS THEREOF NANO & ADVANCED MATERIALS INST LTD (HK) 2025-11-20 US claimed
CN-119469490-A Cross-scale manufacturing method of porous flexible piezoresistive sensor with designable structure 西安交通大学 2025-02-18 CN claimed
EP-4692947-A1 CHEMICAL SOLUTION AND PATTERNING METHOD FUJIFILM Corporation (JP) 2026-02-11 EP disclosed
US-20250390021-A1 CHEMICAL LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2025-12-25 US disclosed
US-20250354017-A1 ANTI-FOGGING AND BACTERIA-RESISTANT LIQUID SILICONE RUBBER ADDITIVES AND THE APPLICATIONS THEREOF NANO & ADVANCED MATERIALS INST LTD (HK) 2025-11-20 US disclosed
US-12435242-B2 Compositions, devices, and methods for improving a surface property of a substrate THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 2025-10-07 US disclosed
US-20250216700-A1 REACTIVE UV ABSORBERS AND ANTI-BLUE LIGHT EYE DEVICE COMPRISING THE SAME EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION (TW) 2025-07-03 US disclosed
US-20250163297-A1 COMPOSITIONS, DEVICES, AND METHODS FOR IMPROVING A SURFACE PROPERTY OF A SUBSTRATE AICP III LP 2025-05-22 US disclosed
US-12234377-B2 Compositions, devices, and methods for improving a surface property of a substrate THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 2025-02-25 US disclosed
CN-119469490-A Cross-scale manufacturing method of porous flexible piezoresistive sensor with designable structure 西安交通大学 2025-02-18 CN disclosed
US-20250036026-A1 IMAGEABLE COMPOSITION FOR PHOTOSENSITIVE NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE, AND PLATEMAKING METHOD THEREFOR ZHEJIANG KONITA NEW MATERIALS CO., LTD. (CN) 2025-01-30 US disclosed
WO-2022200184-A1 PARTICLE COATING BY ATOMIC LAYER DEPOSITION MERZ + BENTELI AG (CH) 2022-09-29 WO disclosed
EP-3617268-B1 AQUEOUS POLYTETRAFLUOROETHYLENE DISPERSION AGC INC (JP) 2022-01-26 EP disclosed
US-9429683-B2 Polymers for contact lenses OCUTEC LIMITED (GB) 2016-08-30 US disclosed
US-20150234094-A1 POLYMERS FOR CONTACT LENSES OCUTEC LIMITED (GB) 2015-08-20 US disclosed
US-8815224-B2 Hair treatment compositions AVON PRODUCTS, INC (US) 2014-08-26 US disclosed
US-20120061877-A1 Hyrdophilic Surface Modification of Polydimethylsiloxane UTAH STATE UNIVERSITY (US) 2012-03-15 US disclosed
US-8053548-B2 Hydrophilic surface modification of polydimethylsiloxane UTAH STATE UNIVERSITY (US) 2011-11-08 US disclosed
US-20080299067-A1 Functionalised Siloxanes for Scar Tissue Treatment QUEENSLAND UNIVERSITY OF TECHNOLOGY (AU) 2008-12-04 US disclosed
US-20070141007-A1 Novel hair treatment compositions CITIBANK, N.A., LONDON BRANCH 2007-06-21 US disclosed