SCHEMBL4029238

SCHEMBL4029238

[O].[Pr].[Si]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29988931 0.82
SCHEMBL30503417 0.82
SCHEMBL9135753 0.82
SCHEMBL4529358 0.82
SCHEMBL1791964 0.82
SCHEMBL7976443 0.82
SCHEMBL189406 0.82
SCHEMBL4529363 0.82
SCHEMBL31531895 0.82
SCHEMBL37809 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114639584-A Semiconductor component, plasma processing apparatus, and method of forming composite coating 中微半导体设备(上海)股份有限公司 2022-06-17 CN disclosed
US-7528434-B2 Production process for a semiconductor component with a praseodymium oxide dielectric IHP GMBH - INNOVATIONS FOR HIGH PERFORMANCE (DE) 2009-05-05 US disclosed
US-20070138519-A1 Production process for a semiconductor component with a praseodymium oxide dielectric IHP GMBH-INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS/INSTITUT FUR INNOVATIVE MIKROELEKTRONIK (DE) 2007-06-21 US disclosed
US-20060138501-A1 Semi-conductor dielectric component with a praseodymium oxide dielectric IHP GMBH-INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS/INSTITUT INNOVATIVE MIKROELEKTRONIK (DE) 2006-06-29 US disclosed