SCHEMBL4032901

SCHEMBL4032901

C=CCOC(=O)/C=C/C(=O)OC=C

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.58
CACNA1B Q00975 1/20 0.58
APBA1 Q02410 1/20 0.58
APP P05067 1/20 0.44
CYP3A4 P08684 3/20 0.38
TSHR P16473 6/20 0.36
HCAR2 Q8TDS4 3/20 0.34
ATM Q13315 1/20 0.34
ALDH1A1 P00352 4/20 0.33
HSD17B10 Q99714 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
CYP2C9 P11712 1/20 0.33
TP53 P04637 2/20 0.31
HIF1A Q16665 2/20 0.31
NPSR1 Q6W5P4 1/20 0.31
PKM P14618 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
SNCA P37840 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL908048 1.00 MAPT (0.58) MAPTCACNA1BAPBA1APPCYP3A4
SCHEMBL908051 1.00 MAPT (0.58) MAPTCACNA1BAPBA1APPCYP3A4
Ether SCHEMBL10711450 0.89 MAPT (0.49) MAPTCACNA1BAPBA1APPCYP3A4
SCHEMBL36139 0.89 MAPT (0.69) MAPTCACNA1BAPBA1APPCYP3A4
SCHEMBL36375 0.89 MAPT (0.69) MAPTCACNA1BAPBA1APPCYP3A4
SCHEMBL6885967 0.89 MAPT (0.69) MAPTCACNA1BAPBA1APPCYP3A4
SCHEMBL36140 0.89 MAPT (0.69) MAPTCACNA1BAPBA1APPCYP3A4
SCHEMBL7809914 0.86 MAPT (0.67) MAPTCACNA1BAPBA1APPCYP3A4
SCHEMBL7809907 0.86 MAPT (0.67) MAPTCACNA1BAPBA1APPCYP3A4
Vinyl Chloride SCHEMBL11883543 0.82 MAPT (0.62) MAPTCACNA1BAPBA1APPCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7589159-B2 Process for producing radical polymer TECHNO NETWORK SHIKOKU CO., LTD. (JP) 2009-09-15 US disclosed
US-20070032615-A1 Process for producing radical polymer TECHNO NETWORK SHIKOKU CO., LTD. (JP) 2007-02-08 US disclosed