⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL30713689 | 1.00 | — | — | |
| Fluoride Ion SCHEMBL15389120 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL29279061 | 0.82 | CA4 (0.33) | — | |
| Fluoride Ion SCHEMBL28637677 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL22554800 | 0.82 | CA4 (0.33) | — | |
| Hydrochloric Acid SCHEMBL9242038 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL31659028 | 0.71 | — | — | |
| Water SCHEMBL2233470 | 0.71 | — | — | |
| SCHEMBL7649903 | 0.71 | — | — | |
| SCHEMBL29447246 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1742 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260068255-A1 | SEMICONDUCTOR STRUCTURE WITH SIDEWALL-FREE DIPOLE METAL FEATURE AND METHOD FOR MANUFACTURING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-05 | — | — | US | claimed |
| US-20260031346-A1 | CATHODE MATERIAL CONTAINING HALOGEN-OXYGEN COMPOUND, METHOD FOR PREPARING SAME, AND CATHODE PLATE | Eastern Institute for Advanced Study (CN) | 2026-01-29 | — | — | US | claimed |
| US-20260026273-A1 | OVERLAYER FILMS AND METHODS FOR ETCHING SILICON-CONTAINING MATERIALS USING A LOW TEMPERATURE DRY CHEMICAL ETCH PROCESS | TOKYO ELECTRON LTD (JP) | 2026-01-22 | — | — | US | claimed |
| US-12506011-B2 | Methods for wet atomic layer etching of transition metal oxide dielectric materials | TOKYO ELECTRON LIMITED (JP) | 2025-12-23 | — | — | US | claimed |
| US-20250357120-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE INCLUDING PLASMA ETCHING PROCESS | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-11-20 | — | — | US | claimed |
| US-20250306450-A1 | OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-10-02 | — | — | US | claimed |
| US-20250230544-A1 | DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES | APPLIED MATERIALS, INC. (US) | 2025-07-17 | — | — | US | claimed |
| WO-2025151418-A1 | DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES | APPLIED MATERIALS, INC. (US) | 2025-07-17 | — | — | WO | claimed |
| US-12356772-B2 | Method of improving performance of devices with QDs comprising thin metal oxide coatings | SHOEI CHEMICAL INC. (JP) | 2025-07-08 | — | — | US | claimed |
| US-12346023-B2 | Optical assembly with coating and methods of use | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-07-01 | — | — | US | claimed |
| US-5200970-A | Methods and compositions for protecting laser excitation gases from contamination | SUMMIT TECHNOLOGY, INC. (US) | 1993-04-06 | — | — | US | claimed |
| EP-0370480-B1 | PROCESS FOR THE PRODUCTION OF HIGH PURITY ZIRCONIUM TETRAFLUORIDE AND OTHER FLUORIDES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1992-12-23 | — | — | EP | claimed |
| US-5076884-A | Reacting with sodium sulfate; precipitating as zirconium or hafnium fluoride | WESTINGHOUSE ELECTRIC CORP. (US) | 1991-12-31 | — | — | US | claimed |
| US-5068492-A | CONTAINER HAVING A HOT WALL WITH A HIGH-TEMPERATURE-TOLERANT CURRENT PASS-THROUGH | FORSCHUNGZENTRUM JULICH GMBH (DE) | 1991-11-26 | — | — | US | claimed |
| EP-0211435-B1 | OPTICAL INFORMATION STORAGE MEDIUM | NEC CORPORATION (JP) | 1991-05-15 | — | — | EP | claimed |
| US-4983373-A | Process for the production of high purity zirconium tetrafluoride and other fluorides | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1991-01-08 | — | — | US | claimed |
| US-4965055-A | Preparation of ultra-pure metal halides | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1990-10-23 | — | — | US | claimed |
| EP-0370480-A1 | Process for the production of high purity zirconium tetrafluoride and other fluorides | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1990-05-30 | — | — | EP | claimed |
| US-4763139-A | NICKEL OXIDE AND TIN | NEC CORPORATION (JP) | 1988-08-09 | — | — | US | claimed |
| EP-0211435-A1 | Optical information storage medium | NEC CORPORATION (JP) | 1987-02-25 | — | — | EP | claimed |