SCHEMBL4065726

SCHEMBL4065726

CC(C)OOP(=O)(OOC(C)C)OOC(C)C

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CTSA P10619 1/20 0.36
ACHE P22303 1/20 0.36
ALDH1A1 P00352 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9037414 0.75
SCHEMBL5024254 0.75
SCHEMBL27802264 0.75 CTSA (0.33) CTSAACHE
SCHEMBL28965064 0.69 CTSA (0.40) CTSAACHEALDH1A1L3MBTL1
SCHEMBL5024231 0.68
SCHEMBL80155 0.65 CTSA (0.56) CTSAACHEALDH1A1L3MBTL1
SCHEMBL45125 0.64
Fluoride SCHEMBL27939414 0.62 CTSA (0.53) CTSAACHEALDH1A1L3MBTL1
Ammonia Solution, Strong SCHEMBL9929782 0.60
SCHEMBL22686515 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118530412-A Binder for negative electrode, negative electrode slurry, negative electrode, and lithium battery 深圳好电科技有限公司 2024-08-23 CN claimed
CN-118530412-A Binder for negative electrode, negative electrode slurry, negative electrode, and lithium battery 深圳好电科技有限公司 2024-08-23 CN disclosed
EP-1589605-B1 DIELECTRIC LINE AND PRODUCTION METHOD THEREFOR KOBE STEEL LTD (JP) 2009-10-21 EP disclosed
US-20090017255-A1 Dielectric line and production method therefor KABUSHIKI KAISHA KOBE SEIKO SHO 2009-01-15 US disclosed
US-7432038-B2 Dielectric line and production method therefor KABUSHIKI KAISHA KOBE SEIKO SHO (JP) 2008-10-07 US disclosed
US-20060102937-A1 Dielectric line and production method therefor KABUSHIKI KOBE SEIKO SHO (JP) 2006-05-18 US disclosed
US-20060051970-A1 Method for forming porous film and porous film formed by the method KABUSHIKI KAISHA KOBE SEIKO SHO 2006-03-09 US disclosed
EP-1589605-A1 DIELECTRIC LINE AND PRODUCTION METHOD THEREFOR Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) (JP) 2005-10-26 EP disclosed
US-20050119360-A1 Method for producing porous material KABUSHIKI KAISHA KOBE SEIKO SHO 2005-06-02 US disclosed