⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL406635 | 1.00 | — | — | |
| SCHEMBL1298132 | 0.82 | — | — | |
| SCHEMBL3436784 | 0.82 | — | — | |
| SCHEMBL28050280 | 0.82 | — | — | |
| SCHEMBL3133483 | 0.82 | — | — | |
| SCHEMBL3436786 | 0.82 | — | — | |
| SCHEMBL7947535 | 0.82 | — | — | |
| SCHEMBL94969 | 0.82 | — | — | |
| SCHEMBL94968 | 0.82 | — | — | |
| SCHEMBL3133493 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102282291-B | Raw material for chemical vapor deposition, and process for forming silicon-containing thin film using same | ADEKA CORP | 2013-08-21 | — | — | CN | disclosed |
| CN-101848917-B | Metal compound, chemical vapor deposition material containing the same, and method for producing metal-containing thin film | ADEKA CORP | 2013-02-27 | — | — | CN | disclosed |
| US-8357815-B2 | Metal compound, material for chemical vapor phase growth, and process for forming metal-containing thin film | ADEKA CORPORATION (JP) | 2013-01-22 | — | — | US | disclosed |
| EP-2233491-B1 | METAL COMPOUND, CHEMICAL VAPOR DEPOSITION MATERIAL CONTAINING THE SAME, AND METHOD FOR PRODUCING METAL-CONTAINING THIN FILM | ADEKA CORP (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120021127-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND PROCESS FOR FORMING SILICON-CONTAINING THIN FILM USING SAME | ADEKA CORPORATION (JP) | 2012-01-26 | — | — | US | disclosed |
| EP-2407576-A1 | PROCESS FOR REMOVING RESIDUAL WATER MOLECULES IN PROCESS FOR PRODUCING METALLIC THIN FILM, AND PURGE SOLVENT | Adeka Corporation (JP) | 2012-01-18 | — | — | EP | disclosed |
| CN-102282291-A | Raw material for chemical vapor deposition, and process for forming silicon-containing thin film using same | — | 2011-12-14 | — | — | CN | disclosed |
| CN-102272349-A | Process for removing residual water molecules in process for producing metallic thin film, and purge solvent | — | 2011-12-07 | — | — | CN | disclosed |
| US-20110268887-A1 | PROCESS FOR REMOVING RESIDUAL WATER MOLECULES IN METALLIC-THIN-FILM PRODUCTION METHOD AND PURGE SOLVENT | ADEKA CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-20100247765-A1 | METAL COMPOUND, MATERIAL FOR CHEMICAL VAPOR PHASE GROWTH, AND PROCESS FOR FORMING METAL-CONTAINING THIN FILM | ADEKA CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| EP-2233491-A1 | METAL COMPOUND, CHEMICAL VAPOR DEPOSITION MATERIAL CONTAINING THE SAME, AND METHOD FOR PRODUCING METAL-CONTAINING THIN FILM | Adeka Corporation (JP) | 2010-09-29 | — | — | EP | disclosed |
| CN-101848917-A | Metal compound, chemical vapor deposition material containing the same, and method for producing metal-containing thin film | ADEKA CORP | 2010-09-29 | — | — | CN | disclosed |
| US-7714155-B2 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| CN-1914150-A | Metal alkoxide compound, thin film-forming material, and method for producing thin film | ASAHI DENKA CO LTD (JP) | 2007-02-14 | — | — | CN | disclosed |