Chloromethane

Chloromethane

SCHEMBL4074685

CCl.[Zr]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Chloromethane SCHEMBL16715719 0.87
Chloromethane SCHEMBL958 0.87
Chloromethane SCHEMBL15532585 0.87
Chloromethane SCHEMBL1330521 0.87
Chloromethane SCHEMBL577900 0.87
Chloromethane SCHEMBL14118491 0.75
Chloromethane SCHEMBL10858831 0.75
Chloromethane SCHEMBL16236654 0.75
Chloromethane SCHEMBL1629119 0.75
Chloromethane SCHEMBL114341 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090156763-A1 Process for manufacturing a thermoplastic elastomeric material PIRELLI & C. S.P.A. (IT) 2009-06-18 US claimed
EP-1919972-A1 PROCESS FOR MANUFACTURING A THERMOPLASTIC ELASTOMERIC MATERIAL Pirelli & C. S.p.A. (IT) 2008-05-14 EP claimed
WO-2007025556-A1 PROCESS FOR MANUFACTURING A THERMOPLASTIC ELASTOMERIC MATERIAL PIRELLI & C. S.P.A. (IT) 2007-03-08 WO claimed
CN-113168093-B Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2024-04-30 CN disclosed
CN-113383273-B Photosensitive resin composition, pattern forming method, cured film, laminate, and device 富士胶片株式会社 2023-11-14 CN disclosed
CN-114402256-A Organic film, method for producing same, composition, laminate, and semiconductor device 富士胶片株式会社 2022-04-26 CN disclosed
CN-113383273-A Photosensitive resin composition, pattern forming method, cured film, laminate, and device 富士胶片株式会社 2021-09-10 CN disclosed
CN-113168093-A Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2021-07-23 CN disclosed
CN-107722148-B Solid polyaluminoxane composition, catalyst for olefin polymerization, and method for producing olefin polymer 三井化学株式会社 2021-06-08 CN disclosed
CN-107722146-B Method for producing solid polyaluminoxane composition 三井化学株式会社 2021-02-26 CN disclosed
CN-109153743-B Solid PMAO composition and method for producing same 东曹精细化工株式会社 2021-02-23 CN disclosed
CN-1165530-A Resin composition and use thereof MITSUI PETROCHEMICAL IND (JP) 1997-11-19 CN disclosed
EP-0516458-B1 Olefin polymerization solid catalyst, olefin polymerization catalyst and olefin polymerization MITSUI PETROCHEMICAL IND (JP) 1997-04-23 EP disclosed
EP-0677526-A1 Organoaluminoxy product, preparation, and use PHILLIPS PETROLEUM COMPANY (US) 1995-10-18 EP disclosed
US-5455316-A Polymerizing or copolymerizing olefins in presence of solid catalyst consisting of aluminoxane and transition metal compound containing cyclopentadienyl skeleton supported on silica particulate carrier MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1995-10-03 US disclosed
US-4579720-A USING HYDROXYMETHANE DIPHOSPHONIC ACID PLAINS CHEMICAL DEVELOPMENT CO. (US) 1986-04-01 US disclosed
US-4440646-A HYDROXY OR HALOALKANEPHOSPHONATES PLAINS CHEMICAL DEVELOPMENT CO. (US) 1984-04-03 US disclosed
US-4188234-A STABILIZATION OF VINYL POLYMERS, POLYPHOSPHONIC ACID CHELATING AGENT, PROTECTIVE COATINGS PLAINS CHEMICAL DEVELOPMENT CO. (US) 1980-02-12 US disclosed
US-4116990-A OF NON-ALKALI METAL IONS WITH PHOSPHORUS CHELATING COMPOUND PLAINS CHEMICAL DEVELOPMENT CO. (US) 1978-09-26 US disclosed
US-4020091-A TIN SALTS OF POLYPHOSPHONIC ACIDS PLAINS CHEMICAL DEVELOPMENT CO. (US) 1977-04-26 US disclosed