Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.59 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | TP53 | P04637 | 3/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | THRB | P10828 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.30 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.30 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22198348 | 0.90 | TSHR (0.49) | TSHRHPGDALDH1A1TP53HIF1A | |
| Methacrylic Acid SCHEMBL10798605 | 0.90 | TSHR (0.49) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL95157 | 0.89 | TSHR (0.64) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Methyl Ester SCHEMBL27859782 | 0.88 | TSHR (0.59) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL13038683 | 0.88 | TSHR (0.50) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL15132268 | 0.85 | TSHR (0.52) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL12629198 | 0.84 | TSHR (0.57) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL3410378 | 0.84 | TSHR (0.59) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL9418348 | 0.84 | TSHR (0.57) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL1723604 | 0.83 | TSHR (0.57) | TSHRHPGDALDH1A1TP53HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 220 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117555204-B | Negative photosensitive polyimide glue solution and glue film suitable for flexible circuit board | 明士(北京)新材料开发有限公司 | 2024-04-26 | — | — | CN | claimed |
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-117430812-B | Photosensitive polyamic acid ester resin, resin composition and application | 明士(北京)新材料开发有限公司 | 2024-03-19 | — | — | CN | claimed |
| CN-117555204-A | Negative photosensitive polyimide glue solution and glue film suitable for flexible circuit board | 明士(北京)新材料开发有限公司 | 2024-02-13 | — | — | CN | claimed |
| CN-117430812-A | Photosensitive polyamic acid ester resin, resin composition and application | 明士(北京)新材料开发有限公司 | 2024-01-23 | — | — | CN | claimed |
| CN-117384378-A | Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116577965-B | Negative photosensitive solid adhesive film and preparation method thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116836388-A | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116577965-A | Negative photosensitive solid adhesive film and preparation method thereof | 明士(北京)新材料开发有限公司 | 2023-08-11 | — | — | CN | claimed |
| CN-115437218-A | Photosensitive resin with symmetrical and asymmetrical structures and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-12-06 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-112279959-B | Ophthalmic polymer material, method for the production and use thereof | 康小林 | 2022-05-03 | — | — | CN | claimed |
| CN-114280887-A | Negative photosensitive solid glue film developed by alkaline water system and preparation method thereof | 明士(北京)新材料开发有限公司 | 2022-04-05 | — | — | CN | claimed |
| EP-0596023-B1 | PAINT COMPOSITION | HEMPELS SKIBSFARVE FAB J C (DK) | 1998-10-14 | — | — | EP | claimed |
| CN-122085600-A | Negative photosensitive resin composition and preparation method and application thereof | — | 2026-05-26 | — | — | CN | disclosed |
| US-4424328-A | POLYMERS OF UNSATURATED MULTIFUNCTIONAL POLYSILOXANES | POLYMER TECHNOLOGY CORPORATION (US) | 1984-01-03 | — | — | US | disclosed |
| US-4148967-A | Metallized plastic molded product and method for producing same | MITSUBISHI RAYON CO., LTD. (JP) | 1979-04-10 | — | — | US | disclosed |